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Cited by 23Low-Pressure Plasma Processing and DiagnosticsVacuum and Plasma ArcsGyrotron and Vacuum Electronics Research

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Three-dimensional electromagnetic PIC model of a compact ECR plasma source

Gopinath, V.P., Grotjohn, T.A.·1995·IEEE Transactions on Plasma Science
DOI 10.1109/27.467980
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Abstract

A three-dimensional electromagnetic particle-in-cell (PIC) model is developed and used to model a compact ECR plasma source. The finite-difference time-domain (FDTD) technique is used to model the microwave fields which excite the plasma at 2.45 GHz. The PIC technique is used to model the dynamics of both the electrons and ions in the plasma. The grid structure used is constructed using the cylindrical coordinate system. Techniques which permit stable numerical solutions in the cylindrical coordinate system are developed and described. The electromagnetic fields and the plasma dynamics are solved in a self-consistent manner. A compact ECR (electron cyclotron resonance) plasma source used for the generation of ions for materials processing is simulated. This source has a plasma size of 3.6 cm in diameter and 3 cm in height. Simulation results of microwave power absorption, plasma potential, and microwave electric fields are presented. Distributed computing techniques are explored to handle the large computer memory requirements and the long computer simulation times associated with the three-dimensional particle-in-cell plasma model.>

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Research works printed but not linked: 23

  1. 10.1016/0010-4655(94)00167-Z · DOI
  2. larson, 1994, 3-D electromagnetic PIC calculations using nonorthogonal unstructured grids, presented at IEEE Int Conf Plasma Sci
  3. 10.1016/0743-7315(90)90095-7 · DOI
  4. 10.1016/0021-9991(89)90153-8 · DOI
  5. 10.1063/1.1141322 · DOI
  6. 10.1063/1.1142887 · DOI
  7. 10.1116/1.575815 · DOI
  8. 10.1109/TMTT.1975.1128640 · DOI
  9. tajima-tochiki, 1988, Computations Plasma Physics
  10. 10.1016/0021-9991(87)90043-X · DOI
  11. 10.1143/JJAP.32.2999 · DOI
  12. 10.1063/1.352144 · DOI
  13. 10.1063/1.1142880 · DOI
  14. 10.1109/TAP.1966.1138693 · DOI · Paper page
  15. 10.1063/1.1144874 · DOI
  16. 10.1116/1.579298 · DOI
  17. 10.1116/1.576649 · DOI
  18. 10.1016/0010-4655(92)90142-L · DOI
  19. 10.1109/27.106815 · DOI
  20. 10.1016/0021-9991(90)90115-H · DOI
  21. kaufman, 1984, Operation of Broad-Beam Sources
  22. 1994, PVM 3 user s guide and reference manual
  23. 10.1063/1.1146040 · DOI

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Metadata

Authors
Gopinath, V. P., & Grotjohn, T. A.
Affiliations
Michigan State University (US)
ORCID
Venue
IEEE Transactions on Plasma Science
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Published
1995
Volume
23
Issue
4
Pages
602-608
ISSN
0093-3813 (ISSN-L)
DOI
10.1109/27.467980
OpenAlex
W2148678637
Cited by
23
References
0
Citations by year
2026: 1 · 2025: 1 · 2023: 2 · 2021: 1 · 2019: 1 · 2018: 1
FWCI
1.92
Type
journal article
Language
en
Open access
closed
Licence
ieeexplore.ieee.org/Xplorehelp/downloads/license-information/IEEE.html (vor)
Locations
IEEE Transactions on Plasma Science (publishedVersion)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Low-Pressure Plasma Processing and Diagnostics
  • Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Vacuum and Plasma Arcs
  • Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Gyrotron and Vacuum Electronics Research
Keywords
electron cyclotron resonance plasma source, particle-in-cell simulation, finite-difference time-domain simulation, 2.45 GHz, plasma dynamics, microwave power absorption, plasma electric potential, distributed computing

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