Cited by 48Advancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesSilicon Carbide Semiconductor Technologies

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Operation of SiGe heterojunction bipolar transistors in the liquid-helium temperature regime

Joseph, A.J., Cressler, J.D., Richey, D.M.·1995·IEEE Electron Device Letters

Abstract

We present the first dc measurements of silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) operating in the liquid-helium temperature (LHeT=4.2 K) regime. The current gain of the self-aligned, UHV/CVD-grown SiGe HBT increases monotonically from 110 at 300 K to 1045 at 5.84 K, although parasitic base current leakage limits the useful operating current to above about 1.0 μA at 5.84 K. An aggressively designed base profile (peak N/sub AB//spl ap/8×10/sup 18/ cm/sup -3/) is used to suppress base freeze-out at LHeT (R/sub bi/=18.3 k/spl Omega///spl square/ at 4.48 K). We have also identified a non-ideal minority carrier transport mechanism in the collector current at temperatures below 77 K (I/sub C/ is not proportional to exp(qV/sub BE//kT)) which is unaccounted for in conventional device theory. Preliminary calculations suggest that this phenomenon is due to trap-assisted carrier tunneling from the emitter to the collector through the base potential barrier.

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References 9 · Cited by 48

Research works printed but not linked: 9

  1. comfort, 1991, IEDM 1991 Tech Dig, 857
  2. 10.1109/16.199359 · DOI
  3. 10.1109/55.334671 · DOI
  4. 10.1109/55.244736 · DOI
  5. 10.1109/16.8784 · DOI
  6. 10.1109/T-ED.1987.22895 · DOI
  7. 10.1109/16.199358 · DOI
  8. 10.1051/jp4:1994620 · DOI
  9. 10.1109/BIPOL.1988.51081 · DOI

Metadata

Authors
Joseph, A. J., Cressler, J. D., & Richey, D. M.
Affiliations
Auburn University (US)
Venue
IEEE Electron Device Letters
Published
1995-06
Volume
16
Issue
6
Pages
268-270
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W2108976516
Cited by
48
References
9
Citations by year
2026: 1 · 2025: 3 · 2024: 2 · 2023: 1 · 2021: 1 · 2020: 1 · 2019: 2 · 2018: 1 · 2017: 3 · 2016: 1 · 2015: 1 · 2014: 4 · 2013: 2 · 2012: 2
FWCI
0.48
Type
journal article
Language
en
Open access
closed
Locations
IEEE Electron Device Letters (publishedVersion)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Semiconductor Devices and Circuit Design
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
Keywords
SiGe HBT, cryogenic electronics, current gain, minority carrier transport, trap-assisted tunneling

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