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High-performance heat sinking for VLSI

Tuckerman, D.B., Pease, R.F.W.·1981·IEEE Electron Device Letters

Abstract

The problem of achieving compact, high-performance forced liquid cooling of planar integrated circuits has been investigated. The convective heat-transfer coefficient h between the substrate and the coolant was found to be the primary impediment to achieving low thermal resistance. For laminar flow in confined channels, h scales inversely with channel width, making microscopic channels desirable. The coolant viscosity determines the minimum practical channel width. The use of high-aspect ratio channels to increase surface area will, to an extent, further reduce thermal resistance. Based on these considerations, a new, very compact, water-cooled integral heat sink for silicon integrated circuits has been designed and tested. At a power density of 790 W/cm2, a maximum substrate temperature rise of 71°C above the input water temperature was measured, in good agreement with theory. By allowing such high power densities, the heat sink may greatly enhance the feasibility of ultrahigh-speed VLSI circuits.

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Metadata

Authors
Tuckerman, D. B., & Pease, R. F. W.
Venue
IEEE Electron Device Letters
Published
1981-05
Volume
2
Issue
5
Pages
126-129
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W2156259175
Cited by
5,291
References
0
FWCI
64.26
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: High-performance heat sinking for VLSI. https://app.cochat.ai/papers/10.1109/edl.1981.25367
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Tuckerman, D. B., & Pease, R. F. W. (1981). High-performance heat sinking for VLSI. IEEE Electron Device Letters. https://doi.org/10.1109/edl.1981.25367

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