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Fundamental mechanism behind volatile and non-volatile switching in metallic conducting bridge RAM
Abstract
We establish an active electrode (AE) selection criterion for volatile and non-volatile switching in metallic conducting bridge (CB) RAM, relevant to cross-point selector and memory applications. Using first principle calculations, we show that: (a) volatile versus non-volatile switching is determined by the energy difference A between the cluster configuration of the AE atoms in the high-resistance (HRS) state, and the filament configuration of the AE atoms in the low-resistance (LRS) state; volatile switching is achieved when A is large, whereas the system will exhibit non-volatile behavior when A ~ 0; (b) the maximum LRS (ON-state) current, Imax that can be delivered while sustaining volatile (selector) operation is proportional to the magnitude of A for the AE. Using molecular dynamical (MD) + NEGF transport simulations, supported by experiments, we confirm the volatile (selector) switching characteristics of Ag/HfÖ2/Pt, and the non-volatile (memory) switching characteristics of Co/HfO2/Pt, as predicted by our criterion; the corresponding temporal characteristics are also evaluated. Finally, we calculate the expected switching characteristics for various active electrodes (AEs), showing excellent agreement with experimental results. Our findings enable the design of CBRAM-based selectors and memory with the required switching properties.
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“The decay of the conductance is considered to arise from the surface diffusion of Ag caused by the Gibbs -Thomson effect 41 -45 .”
From Enhanced analog synaptic behavior of SiNx/a-Si bilayer memristors through Ge implantation (2020) · cites this paper as [44]
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Research works printed but not linked: 6
- song, 2016, Monolithic integration of AgTe/TiO2 based threshold switching device with TiN liner for steep slope field-effect transistors, International Electron Device Meeting
- 10.1109/IEDM.2015.7409669 · DOI
- 10.1103/PhysRevApplied.7.034020 · DOI
- 10.1063/1.4960690 · DOI
- shukla, 2016, Ag/HfO2 based threshold switch with extreme non-linearity for unipolar cross-point memory and steep-slope phase-FETs, International Electron Device Meeting
- 10.1109/IMW.2014.6849351 · DOI
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Enhanced analog synaptic behavior of SiNx/a-Si bilayer memristors through Ge implantation
Kim, K., Park, S., Hu, S. M., Song, J., Lim, W., Jeong, Y., Kim, J., Lee, S., Kwak, J. Y., Park, J., et al. (2020) · NPG Asia Materials · doi:10.1038/s41427-020-00261-0 · Cited by 28
Metadata
- Authors
- Shukla, N., Ghosh, R. K., Grisafe, B., & Datta, S.
- Affiliations
- University of Notre Dame (US)
- Venue
- 2017 IEEE International Electron Devices Meeting (IEDM)
- Publisher
- IEEE
- Published
- 2017-12
- Pages
- 4.3.1-4.3.4
- ISSN
- 0163-1918 (ISSN-L)
- OpenAlex
- W2786143922
- Cited by
- 41
- References
- 0
- Citations by year
- 2026: 1 · 2025: 4 · 2024: 7 · 2023: 5 · 2022: 3 · 2021: 6 · 2020: 7 · 2019: 7 · 2018: 1
- FWCI
- 5.80
- Type
- conference paper
- Language
- en
- Open access
- closed
- Locations
- Technical digest - International Electron Devices Meeting/Technical digest (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Memory and Neural Computing
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Ferroelectric and Negative Capacitance Devices
- Physical Sciences › Materials Science › Materials Chemistry › Phase-change materials and chalcogenides
- Keywords
- volatile switching, nonvolatile switching, resistive random access memory, cluster configuration, on-state current, switching characteristics
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