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Static-noise margin analysis of MOS SRAM cells

Seevinck, E., List, F.J., Lohstroh, J.·1987·IEEE Journal of Solid-State Circuits

Abstract

The stability of both resistor-load (R-load) and full-CMOS SRAM cells is investigated analytically as well as by simulation. Explicit analytic expressions for the static-noise margin (SNM) as a function of device parameters and supply voltage are derived. The expressions are useful in predicting the effect of parameter changes on the stability as well as in optimizing the design of SRAM cells. An easy-to-use SNM simulation method is presented, the results of which are in good agreement with the results predicted by the analytic SNM expressions. It is further concluded that full-CMOS cells are much more stable than R-local cells at a low supply voltage.

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Metadata

Authors
Seevinck, E., List, F. J., & Lohstroh, J.
Venue
IEEE Journal of Solid-State Circuits
Published
1987-10
Volume
22
Issue
5
Pages
748-754
ISSN
0018-9200 (ISSN-L)
OpenAlex
W2002612140
Cited by
1,436
References
0
FWCI
7.67
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Static-noise margin analysis of MOS SRAM cells. https://app.cochat.ai/papers/10.1109/jssc.1987.1052809
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Seevinck, E., List, F. J., & Lohstroh, J. (1987). Static-noise margin analysis of MOS SRAM cells. IEEE Journal of Solid-State Circuits. https://doi.org/10.1109/jssc.1987.1052809

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