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Cited by 204

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A Phenomenological Model for the Reset Mechanism of Metal Oxide RRAM

Yu, Shimeng, Wong, H.-S. Philip·2010·IEEE Electron Device Letters

Abstract

The reset mechanism of metal oxide RRAM has been attributed to oxygen ion migration assisted by Joule heating. Here, we present a phenomenological model to provide a unified explanation for both the unipolar and bipolar resistive switching mechanisms. Numerical simulation results reveal that the switching mode is determined by the electrode/oxide interface property. Without/with an interfacial barrier, unipolar/bipolar switching behavior is obtained. This model combines the previous thermal dissolution model and ion migration model and thus can explain many experimental observations such as the electrode-material-dependent switching polarity and the voltage-time dilemma between fast switching and long retention.

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Metadata

Authors
Yu, S., & Wong, H.-S. P.
Venue
IEEE Electron Device Letters
Published
2010-12
Volume
31
Issue
12
Pages
1455-1457
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W1980284740
Cited by
204
References
1
FWCI
16.45
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: A Phenomenological Model for the Reset Mechanism of Metal Oxide RRAM. https://app.cochat.ai/papers/10.1109/led.2010.2078794
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Yu, S., & Wong, H.-S. P. (2010). A Phenomenological Model for the Reset Mechanism of Metal Oxide RRAM. IEEE Electron Device Letters. https://doi.org/10.1109/led.2010.2078794

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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