Cited by 109GaN-based semiconductor devices and materialsThermal properties of materialsSilicon Carbide Semiconductor Technologies

Low Thermal Resistances at GaN–SiC Interfaces for HEMT Technology

Cho, Jungwan, Bozorg-Grayeli, Elah, Altman, David H., Asheghi, Mehdi, Goodson, Kenneth E.·2012·IEEE Electron Device Letters

Abstract

The temperature rise in AlGaN/GaN high-electron-mobility transistors depends strongly on the GaN-substrate thermal interface resistance (TIR). We apply picosecond time-domain thermoreflectance measurements to GaN-SiC composite substrates with varying GaN thickness to extract both the TIR and the intrinsic GaN thermal conductivity at room temperature. Two complementary data extraction methodologies yield 4-5 for the GaN-SiC TIR and 157-182 for the GaN conductivity. The GaN-SiC interface resistance values reported here, as well as the TIR experimental uncertainties documented in this letter, are substantially lower than those reported previously for this material combination.

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Crossref · 10.1109/led.2011.2181481

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1 of 1 references verified0 citation errors · 0 not checkable

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  • Thin film architectures and nanostructures possess reduced thermal conductivities compared to bulk materials due to boundary scattering, which limits phonon MFPs.

    “Thin film architectures and nanostructures possess reduced thermal conductivities compared to bulk materials due to boundary scattering, which limits phonon MFPs202122.”

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Authors
Cho, J., Bozorg-Grayeli, E., Altman, D. H., Asheghi, M., & Goodson, K. E.
Affiliations
  • Stanford University (US)
  • Raytheon (United States) (US)
Venue
IEEE Electron Device Letters
Published
2012-03
Volume
33
Issue
3
Pages
378-380
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W1991654529
Cited by
109
References
1
Citations by year
2026: 4 · 2025: 6 · 2024: 10 · 2023: 4 · 2022: 9 · 2021: 5 · 2020: 9 · 2019: 9 · 2018: 7 · 2017: 12 · 2016: 7 · 2015: 5 · 2014: 8 · 2013: 8 · 2012: 6
FWCI
5.87
Type
journal article
Language
en
Open access
closed
Locations
IEEE Electron Device Letters (publishedVersion)
Topics
  • Physical Sciences › Physics and Astronomy › Condensed Matter Physics › GaN-based semiconductor devices and materials
  • Physical Sciences › Materials Science › Materials Chemistry › Thermal properties of materials
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
Keywords
interfacial thermal resistance, AlGaN/GaN HEMT, temperature rise

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