Low Thermal Resistances at GaN–SiC Interfaces for HEMT Technology
Abstract
The temperature rise in AlGaN/GaN high-electron-mobility transistors depends strongly on the GaN-substrate thermal interface resistance (TIR). We apply picosecond time-domain thermoreflectance measurements to GaN-SiC composite substrates with varying GaN thickness to extract both the TIR and the intrinsic GaN thermal conductivity at room temperature. Two complementary data extraction methodologies yield 4-5 for the GaN-SiC TIR and 157-182 for the GaN conductivity. The GaN-SiC interface resistance values reported here, as well as the TIR experimental uncertainties documented in this letter, are substantially lower than those reported previously for this material combination.
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Thin film architectures and nanostructures possess reduced thermal conductivities compared to bulk materials due to boundary scattering, which limits phonon MFPs.
“Thin film architectures and nanostructures possess reduced thermal conductivities compared to bulk materials due to boundary scattering, which limits phonon MFPs202122.”
From Universal phonon mean free path spectra in crystalline semiconductors at high temperature (2013) · cites this paper as [20]
Cites
Thermal conductivity and electrical properties of 6 <i>H</i> silicon carbide
Burgemeister, E. A., von Muench, W., & Pettenpaul, E. (1979) · Journal of Applied Physics · doi:10.1063/1.326720 · Cited by 168 · see citing works
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Universal phonon mean free path spectra in crystalline semiconductors at high temperature
Freedman, J. P., Leach, J. H., Preble, E. A., Sitar, Z., Davis, R. F., & Malen, J. A. (2013) · Scientific Reports · doi:10.1038/srep02963 · Cited by 171 · see citing works
Cooling Limits for GaN HEMT Technology
Won, Y., Cho, J., Agonafer, D., Asheghi, M., & Goodson, K. E. (2013) · 2013 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS) · doi:10.1109/csics.2013.6659222 · Cited by 57 · see citing works
Self-citationTemperature Dependent Thermal Resistances at GaN-Substrate Interfaces in GaN Composite Substrates
Cho, J., Li, Y., Altman, D. H., Hoke, W. E., Asheghi, M., & Goodson, K. E. (2012) · 2012 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS) · doi:10.1109/csics.2012.6340094 · Cited by 22 · see citing works
Self-citation
- Authors
- Cho, J., Bozorg-Grayeli, E., Altman, D. H., Asheghi, M., & Goodson, K. E.
- Affiliations
- Stanford University (US)
- Raytheon (United States) (US)
- Venue
- IEEE Electron Device Letters
- Published
- 2012-03
- Volume
- 33
- Issue
- 3
- Pages
- 378-380
- ISSN
- 0741-3106 (ISSN-L)
- 1558-0563
- OpenAlex
- W1991654529
- Cited by
- 109
- References
- 1
- Citations by year
- 2026: 4 · 2025: 6 · 2024: 10 · 2023: 4 · 2022: 9 · 2021: 5 · 2020: 9 · 2019: 9 · 2018: 7 · 2017: 12 · 2016: 7 · 2015: 5 · 2014: 8 · 2013: 8 · 2012: 6
- FWCI
- 5.87
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- IEEE Electron Device Letters (publishedVersion)
- Topics
- Physical Sciences › Physics and Astronomy › Condensed Matter Physics › GaN-based semiconductor devices and materials
- Physical Sciences › Materials Science › Materials Chemistry › Thermal properties of materials
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
- Keywords
- interfacial thermal resistance, AlGaN/GaN HEMT, temperature rise
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