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Cited by 495

The DOI matches its Crossref record; 5 of the 5 references it cites were found in a registry or an index.

Resistive Switching by Voltage-Driven Ion Migration in Bipolar RRAM—Part II: Modeling

Larentis, Stefano, Nardi, Federico, Balatti, Simone, Gilmer, David C., Ielmini, Daniele·2012·IEEE Transactions on Electron Devices

Abstract

Resistive-switching memory (RRAM) based on transition metal oxides is a potential candidate for replacing Flash and dynamic random access memory in future generation nodes. Although very promising from the standpoints of scalability and technology, RRAM still has severe drawbacks in terms of understanding and modeling of the resistive-switching mechanism. This paper addresses the modeling of resistive switching in bipolar metal-oxide RRAMs. Reset and set processes are described in terms of voltage-driven ion migration within a conductive filament generated by electroforming. Ion migration is modeled by drift–diffusion equations with Arrhenius-activated diffusivity and mobility. The local temperature and field are derived from the self-consistent solution of carrier and heat conduction equations in a 3-D axis-symmetric geometry. The model accounts for set–reset characteristics, correctly describing the abrupt set and gradual reset transitions and allowing scaling projections for metal-oxide RRAM.

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Metadata

Authors
Larentis, S., Nardi, F., Balatti, S., Gilmer, D. C., & Ielmini, D.
Venue
IEEE Transactions on Electron Devices
Published
2012-09
Volume
59
Issue
9
Pages
2468-2475
ISSN
  • 0018-9383 (ISSN-L)
  • 1557-9646
OpenAlex
W2051133151
Cited by
495
References
5
FWCI
22.59
Type
journal article
Language
en
Open access
closed

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Larentis, S., Nardi, F., Balatti, S., Gilmer, D. C., & Ielmini, D. (2012). Resistive Switching by Voltage-Driven Ion Migration in Bipolar RRAM—Part II: Modeling. IEEE Transactions on Electron Devices. https://doi.org/10.1109/ted.2012.2202320

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