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Step and flash imprint lithography: Template surface treatment and defect analysis
Abstract
We have finished the construction of an automated tool for step and flash imprint lithography. The tool was constructed to allow defect studies by making multiple imprints on a 200 mm wafer. The imprint templates for this study were treated with a low surface energy, self-assembled monolayer to ensure selective release at the template-etch barrier interface. This surface treatment is very durable and survives repeated imprints and multiple aggressive physical and chemical cleanings. The imprint and release forces were measured for a number of successive imprints, and did not change significantly. The process appears to be “self-cleaning.” Contamination on the template is entrained in the polymerizing liquid, and the number of defects is reduced with repeated imprints.
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Citations
Cited by
High‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies
Rolland, J. P., Hagberg, E. C., Denison, G. M., Carter, K. R., & De Simone, J. M. (2004) · Angewandte Chemie International Edition · doi:10.1002/anie.200461122 · Cited by 292
Biradar, M. R., Sagdic, G., Yuan, C., Marui, R., & Ober, C. K. (2026) · Chemical Reviews · doi:10.1021/acs.chemrev.5c01043 · Cited by 6
Metadata
- Authors
- Bailey, T., Choi, B. J., Colburn, M., Meissl, M., Shaya, S., Ekerdt, J. G., Sreenivasan, S. V., & Willson, C. G.
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Publisher
- American Vacuum Society
- Published
- 2000-11-01
- Volume
- 18
- Issue
- 6
- Pages
- 3572-3577
- ISSN
- 1071-1023 (ISSN-L)
- 1520-8567
- OpenAlex
- W2138368127
- Cited by
- 351
- References
- 0
- FWCI
- 10.78
- Type
- journal article
- Language
- en
- Open access
- closed
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- CoChat. (2026). Citation check: Step and flash imprint lithography: Template surface treatment and defect analysis. https://app.cochat.ai/papers/10.1116/1.1324618
- The paper
- Bailey, T., Choi, B. J., Colburn, M., Meissl, M., Shaya, S., Ekerdt, J. G., Sreenivasan, S. V., & Willson, C. G. (2000). Step and flash imprint lithography: Template surface treatment and defect analysis. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.1324618
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
