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Microstructural evolution during film growth
Abstract
Atomic-scale control and manipulation of the microstructure of polycrystalline thin films during kinetically limited low-temperature deposition, crucial for a broad range of industrial applications, has been a leading goal of materials science during the past decades. Here, we review the present understanding of film growth processes—nucleation, coalescence, competitive grain growth, and recrystallization—and their role in microstructural evolution as a function of deposition variables including temperature, the presence of reactive species, and the use of low-energy ion irradiation during growth.
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Cited by
Plasmonic films can easily be better: Rules and recipes
McPeak, K. M., Jayanti, S. V., Kress, S. J. P., Meyer, S., Iotti, S., Rossinelli, A. A., & Norris, D. J. (2015) · doi:10.3929/ethz-b-000100036 · Cited by 616
Elias, C. N., Oshida, Y., Lima, J. H. C., & Muller, C. A. (2008) · Journal of the Mechanical Behavior of Biomedical Materials · doi:10.1016/j.jmbbm.2007.12.002 · Cited by 462
A Kinetic Model for Stress Generation in Thin Films Grown from Energetic Vapor Fluxes
Chason, E., Karlson, M., Colin, J. J., Magnfält, D., Sarakinos, K., & Abadias, G. (2016) · Journal of Applied Physics · doi:10.1063/1.4946039 · Cited by 90
Metadata
- Authors
- Petrov, I., Barna, P. B., Hultman, L., & Greene, J. E.
- Venue
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- Publisher
- American Vacuum Society
- Published
- 2003-09-01
- Volume
- 21
- Issue
- 5
- Pages
- S117-S128
- ISSN
- 0734-2101 (ISSN-L)
- 1520-8559
- OpenAlex
- W1981966175
- Cited by
- 1,787
- References
- 0
- FWCI
- 44.42
- Type
- journal article
- Language
- en
- Open access
- closed
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- CoChat. (2026). Citation check: Microstructural evolution during film growth. https://app.cochat.ai/papers/10.1116/1.1601610
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- Petrov, I., Barna, P. B., Hultman, L., & Greene, J. E. (2003). Microstructural evolution during film growth. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. https://doi.org/10.1116/1.1601610
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