The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
High-resolution EUV imaging tools for resist exposure and aerial image monitoring
Abstract
Key features are presented of two high-resolution EUV imaging tools: the MS-13 Microstepper wafer exposure and the RIM-13 reticle imaging microscope. The MS-13 has been developed for EUV resist testing and technology evaluation at the 32nm node and beyond, while the RIM-13 is designed for actinic aerial image monitoring of blank and patterned EUV reticles. Details of the design architecture, module layout, major subsystems and performance are presented for both tools.
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Submicron, soft x-ray fluorescence imaging
Fontaine, B. L., MacDowell, A. A., Tan, Z., et al. (1995) · Applied Physics Letters · doi:10.1063/1.113518 · Cited by 2
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Evolution in Lithography Techniques: Microlithography to Nanolithography
Sharma, E., Rathi, R., Misharwal, J., Sinhmar, B., Kumari, S., Dalal, J., & Kumar, A. (2022) · Nanomaterials · doi:10.3390/nano12162754 · Cited by 257
Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Metadata
- Authors
- Booth, M., Brisco, O., Brunton, A., Cashmore, J., Elbourn, P., Elliner, G., Gower, M., Greuters, J., Grunewald, P., Gutierrez, R., Hill, T., Hirsch, J., Kling, L., McEntee, N., Mundair, S., Richards, P., Truffert, V., Wallhead, I., Whitfield, M., & Hudyma, R.
- Venue
- SPIE Proceedings
- Publisher
- SPIE
- Published
- 2005-05-06
- Volume
- 5751
- Pages
- 78
- ISSN
- 0277-786X (ISSN-L)
- OpenAlex
- W2090087215
- Cited by
- 39
- References
- 1
- Citations by year
- 2024: 2 · 2022: 1 · 2020: 1 · 2014: 1 · 2013: 1 · 2012: 1
- FWCI
- 11.00
- Type
- conference paper
- Language
- en
- Open access
- closed
- Locations
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (publishedVersion)
- Funders
- Intel Corporation
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Advanced optical system design
- Keywords
- EUV lithography, EUV reticles, 32 nm technology node, technology evaluation
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