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Molecular Rulers for Scaling Down Nanostructures
Open accessAbstract
A method of constructing <30-nanometer structures in close proximity with precise spacings is presented that uses the step-by-step application of organic molecules and metal ions as size-controlled resists on predetermined patterns, such as those formed by electron-beam lithography. The organic molecules serve as a ruler for scaling down a larger “parent” structure. After metal deposition and lift-off of the organic multilayer resist, an isolated smaller structure remains on the surface. This approach is used to form thin parallel wires (15 to 70 nanometers in width and 1 micrometer long) of controlled thickness and spacing. The structures obtained were imaged with field emission scanning electron microscopy. A variety of nanostructures could be scaled down, including structures with hollow patterns.
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Metadata
- Authors
- Hatzor, A., & Weiss, P. S.
- Venue
- Science
- Published
- 2001-02-09
- Volume
- 291
- Issue
- 5506
- Pages
- 1019-1020
- ISSN
- 0036-8075 (ISSN-L)
- 1095-9203
- OpenAlex
- W4236452689
- Cited by
- 1,681
- References
- 0
- FWCI
- 87.41
- Type
- journal article
- Language
- en
- Open access
- green
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