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Cited by 1,150

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Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

Ruiz, Ricardo, Kang, Huiman, Detcheverry, François A., Dobisz, Elizabeth, Kercher, Dan S., Albrecht, Thomas R., de Pablo, Juan J., Nealey, Paul F.·2008·Science

Abstract

Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self-assembly are small, and low-energy defects can get easily trapped. We directed the assembly of defect-free arrays of isolated block copolymer domains at densities up to 1 terabit per square inch on chemically patterned surfaces. In comparing the assembled structures to the chemical pattern, the density is increased by a factor of four, the size is reduced by a factor of two, and the dimensional uniformity is vastly improved.

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Metadata

Authors
Ruiz, R., Kang, H., Detcheverry, F. A., Dobisz, E., Kercher, D. S., Albrecht, T. R., de Pablo, J. J., & Nealey, P. F.
Venue
Science
Published
2008-08-15
Volume
321
Issue
5891
Pages
936-939
ISSN
  • 0036-8075 (ISSN-L)
  • 1095-9203
OpenAlex
W4233417203
Cited by
1,150
References
0
FWCI
41.09
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly. https://app.cochat.ai/papers/10.1126/science.1157626
The paper
Ruiz, R., Kang, H., Detcheverry, F. A., Dobisz, E., Kercher, D. S., Albrecht, T. R., de Pablo, J. J., & Nealey, P. F. (2008). Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly. Science. https://doi.org/10.1126/science.1157626

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.