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Electric Conduction in Phosphorus Doped Silicon at Low Temperatures

Yamanouchi, Chikako, Mizuguchi, Kanji, Sasaki, Wataru·1967·Journal of the Physical Society of Japan

Abstract

The impurity conduction in phosphorus doped n -type silicon has been investigated at temperatures between 1.1°K and 300°K. The samples ranged in concentration of excess donors from 1.2.10 18 to 2.5.10 20 cm -3 . A metallic type impurity conduction and a negative magnetoresistance are observed in samples containing higher than 4.10 18 cm -3 excess donors. An intermediate type impurity conduction is observed in samples containing from 1.7.10 18 to 4.10 18 cm -3 excess donors. In metallic samples with donor concentration higher than 6.10 18 cm -3 , the resistivity increases monotonically with temperature T up to the Fermi degeneracy temperature T D of respective samples according to a simple formula, ρ( T )=ρ(4.2^°K)[1+ A ( T / T D ) B ], where A and B are constants.

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Metadata

Authors
Yamanouchi, C., Mizuguchi, K., & Sasaki, W.
Venue
Journal of the Physical Society of Japan
Published
1967-03
Volume
22
Issue
3
Pages
859-864
ISSN
  • 0031-9015 (ISSN-L)
  • 1347-4073
OpenAlex
W2025567706
Cited by
280
References
0
FWCI
7.29
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Electric Conduction in Phosphorus Doped Silicon at Low Temperatures. https://app.cochat.ai/papers/10.1143/jpsj.22.859
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Yamanouchi, C., Mizuguchi, K., & Sasaki, W. (1967). Electric Conduction in Phosphorus Doped Silicon at Low Temperatures. Journal of the Physical Society of Japan. https://doi.org/10.1143/jpsj.22.859

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