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Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering
Abstract
Ion-beam sputter deposition of tantalum oxide films was investigated for possible optical coating applications. Optical properties of such films were found to be a sensitive function of oxygen-to-argon ratio in the ion beam. Refractive index and absorption coefficient were determined in the 250–2000-nm wavelength range by spectrophotometric transmissivity. The different bonding states of the tantalum atoms were revealed by x-ray photoelectron spectroscopy. The visible wavelength refractive index was found to be 2.18 and optical band gap 4.3 eV, so long as the films did not contain inclusions of metallic tantalum. Films with an admixture of oxygen deficient suboxide components had a low-energy tail of increasing magnitude in the absorption spectrum.
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Cited by
Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
Chaneliere, C., Autran, J. L., Devine, R. A. B., & Balland, B. (1998) · Materials Science and Engineering: R: Reports · doi:10.1016/s0927-796x(97)00023-5 · Cited by 678
Tantala Kerr-nonlinear integrated photonics
Jung, H., Yu, S.-P., Carlson, D. R., Drake, T. E., Briles, T. C., & Papp, S. B. (2021) · Optica · doi:10.1364/optica.411968 · Cited by 184
Metadata
- Authors
- Demiryont, H., Sites, J. R., & Geib, K.
- Venue
- Applied Optics
- Publisher
- Optica Publishing Group
- Published
- 1985-02-15
- Volume
- 24
- Issue
- 4
- Pages
- 490
- ISSN
- 0003-6935 (ISSN-L)
- 1539-4522
- OpenAlex
- W2038421650
- Cited by
- 169
- References
- 0
- FWCI
- 4.18
- Type
- journal article
- Language
- en
- Open access
- closed
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- Demiryont, H., Sites, J. R., & Geib, K. (1985). Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering. Applied Optics. https://doi.org/10.1364/ao.24.000490
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