The DOI matches its Crossref record; 29 of the 29 references it cites were found in a registry or an index.
Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography
Open accessAbstract
The continuous shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical projection lithography process, generating circuit patterns that deviate significantly from the desired ones. Conventional resolution enhancement techniques (RETs) are facing critical challenges in compensating such increasingly severe distortion. In this paper, we adopt the approach of inverse lithography in the mask design, which is a branch of design methodology to treat it as an inverse mathematical problem. We focus on using pixel-based algorithms to design alternating phase-shifting masks with minimally distorted output, with the goal that the patterns generated should have high contrast and low dose sensitivity. This is achieved with a dynamic-programming-based initialization scheme to pre-assign phases to the layout when alternating phase-shifting masks are used. Pattern fidelity and worst case slopes are shown to improve with this initialization scheme, which are important for robustness considerations.
Overview
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
Citations
Cites
Principles of mathematical analysis
Rudin, W. (1964) · UCLA - Biblioteca de Ciencias y Tecnologia Felix Morales Bueno · Cited by 5,218
(2007) · Springer eBooks · doi:10.1007/978-0-387-71107-2 · Cited by 2,696
Goodman, J. W. (1985) · Cited by 2,605
Stockman, G. C., & Shapiro, L. G. (2001) · Cited by 1,706
Projective image restoration using sparsity regularization
Anantrasirichai, N., Burn, J. F., & Bull, D. (2013) · Proceedings - International Conference on Image Processing · doi:10.1109/icip.2013.6738223 · Cited by 735
Mathematical Programming: Theory and Algorithms.
Smith, D. K., Minoux, M., & VAJDA, S. (1987) · Journal of the Operational Research Society · doi:10.2307/2582404 · Cited by 571
Resolution Enhancement Techniques in Optical Lithography
Wong, A. K. K. (2001) · SPIE eBooks · doi:10.1117/3.401208 · Cited by 447
Self-citationMask Design for Optical Microlithography—An Inverse Imaging Problem
Poonawala, A. A., & Milanfar, P. (2007) · IEEE Transactions on Image Processing · doi:10.1109/tip.2006.891332 · Cited by 219
Phase-shifting masks for microlithography: automated design and mask requirements
Pati, Y. C., & Kailath, T. (1994) · Journal of the Optical Society of America A · doi:10.1364/josaa.11.002438 · Cited by 156
Resolution enhancement technology: the past, the present, and extensions for the future
Schellenberg, F. M. (2004) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.548923 · Cited by 117
Binary and phase shifting mask design for optical lithography
Liu, Y., & Zakhor, A. (1992) · IEEE Transactions on Semiconductor Manufacturing · doi:10.1109/66.136275 · Cited by 106
Fast inverse lithography technology
Abrams, D. S., & Pang, L. (2006) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.658876 · Cited by 98
Inverse Lithography Technology (ILT): what is the impact to the photomask industry?
Pang, L., Liu, Y., & Abrams, D. (2006) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.681857 · Cited by 82
Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks
Saleh, B. E. A., & Sayegh, S. I. (1981) · Optical Engineering · doi:10.1117/12.7972810 · Cited by 82
Generalized inverse lithography methods for phase-shifting mask design
Ma, X., & Arce, G. R. (2007) · Optics Express · doi:10.1364/oe.15.015066 · Cited by 76
Solving inverse problems of optical microlithography
Granik, Y. (2005) · Optical Microlithography XVIII · doi:10.1117/12.600141 · Cited by 65
OPC and PSM design using inverse lithography: a nonlinear optimization approach
Poonawala, A. A., & Milanfar, P. (2006) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.655904 · Cited by 58
Image construction through diffraction-limited high-contrast imaging systems: an iterative approach
Nashold, K. M., & Saleh, B. E. A. (1985) · Journal of the Optical Society of America A · doi:10.1364/josaa.2.000635 · Cited by 54
Binary image synthesis using mixed linear integer programming
Sherif, S. A., Saleh, B. E. A., & Leone, R. D. (1995) · IEEE Transactions on Image Processing · doi:10.1109/83.413169 · Cited by 52
Thirty years of lithography simulation
Mack, C. A. (2005) · Optical Microlithography XVIII · doi:10.1117/12.601590 · Cited by 45
Optimal binary image design for optical lithography
Liu, Y., & Zakhor, A. (1990) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.20216 · Cited by 43
Fast sparse aerial-image calculation for OPC
Cobb, N. B., & Zakhor, A. (1995) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.228208 · Cited by 39
Optimal phase conflict removal for layout of dark field alternating phase shifting masks
Berman, P., Kahng, A. B., Vidhani, D., et al. (2000) · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · doi:10.1109/43.828546 · Cited by 33
Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design
Moniwa, A., Terasawa, T., Nakajo, K., et al. (1995) · Japanese Journal of Applied Physics · doi:10.1143/jjap.34.6584 · Cited by 24
Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation
Hung, C., Zhang, B., Guo, E., et al. (2006) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.655728 · Cited by 24
Binary and phase-shifting image design for optical lithography
Liu, Y., & Zakhor, A. (1991) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.44797 · Cited by 23
Prewarping techniques in imaging: applications in nanotechnology and biotechnology
Poonawala, A. A., & Milanfar, P. (2005) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.597694 · Cited by 22
Inverse image problem of designing phase shifting masks in optical lithography
Chan, S. H., & Lam, E. Y. M. (2008) · Proceedings - International Conference on Image Processing · doi:10.1109/icip.2008.4712134 · Cited by 12
Self-citationInverse Synthesis of Phase-Shifting Mask for Optical Lithography
Chan, S. H., Wong, A. K. K., & Lam, E. Y. M. (2007) · Adaptive Optics: Analysis and Methods/Computational Optical Sensing and Imaging/Information Photonics/Signal Recovery and Synthesis Topical Meetings on CD-ROM · doi:10.1364/srs.2007.smd3 · Cited by 6
Self-citation
Research works printed but not linked: 4
- Mack, 2004, Proc. SPIE, 5754, 1
- Liu, 1990, Proc. SPIE, 1264, 410
- Abrams, 2006, Proc. SPIE, 6154, 534
- Berman, 2000, IEEE Trans., 19, 175
Cited by
Sorted by citations
Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Metadata
- Authors
- Chan, S. H., Wong, A. K., & Lam, E. Y.
- Affiliations
- University of Hong Kong (HK)
- Venue
- Optics Express
- Publisher
- Optica Publishing Group
- Published
- 2008-09-04
- Volume
- 16
- Issue
- 19
- Pages
- 14746
- ISSN
- 1094-4087 (ISSN-L)
- OpenAlex
- W2065950608
- Cited by
- 41
- References
- 29
- Citations by year
- 2026: 1 · 2024: 3 · 2023: 2 · 2022: 3 · 2021: 1 · 2020: 1 · 2014: 2 · 2013: 2 · 2012: 7
- FWCI
- 5.68
- Type
- journal article
- Language
- en
- Open access
- gold
- doi.org
- Locations
- Optics Express (publishedVersion)
- PubMed (publishedVersion)
- The HKU Scholars Hub (University of Hong Kong) (submittedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Advanced optical system design
- Physical Sciences › Engineering › Electrical and Electronic Engineering › VLSI and FPGA Design Techniques
- Keywords
- inverse lithography technology, phase-shifting masks, alternating phase-shifting masks, optical projection lithography, mask design, initialization scheme, dynamic programming, resolution enhancement techniques, pattern fidelity, dosage sensitivity, pattern distortion, inverse problems
- MeSH terms
- Algorithms, Image Interpretation, Computer-Assisted, Lasers, Lighting, Photography
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
