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Broadband antireflection gratings fabricated upon silicon substrates

Kanamori, Y., Sasaki, M., Hane, K.·1999·Optics Letters

Abstract

We fabricated a two-dimensional subwavelength structured (SWS) surface upon a crystal silicon substrate. The SWS surface was patterned by electron beam lithography and etched by an SF(6) fast atom beam. The SWS grating had a conical profile, the period was 150 nm, and the groove was approximately 350 nm deep. The reflectivity was examined at 2002500-nm wavelengths. At 400 nm the reflectivity decreased to 0.5% from the 54.7% of the silicon substrate. We also used HeNe laser light to examine the reflectivity as a function of the incident angle.

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Metadata

Authors
Kanamori, Y., Sasaki, M., & Hane, K.
Venue
Optics Letters
Published
1999-10-15
Volume
24
Issue
20
Pages
1422
ISSN
  • 0146-9592 (ISSN-L)
  • 1539-4794
OpenAlex
W2019290169
Cited by
439
References
0
FWCI
4.18
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Broadband antireflection gratings fabricated upon silicon substrates. https://app.cochat.ai/papers/10.1364/ol.24.001422
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Kanamori, Y., Sasaki, M., & Hane, K. (1999). Broadband antireflection gratings fabricated upon silicon substrates. Optics Letters. https://doi.org/10.1364/ol.24.001422

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