Mack, Chris A.

Fifty Years of Moore's Law

Mack, C. A. (2011) · IEEE Transactions on Semiconductor Manufacturing

History of Computing TechnologiesAdvancements in Semiconductor Devices and Circuit Design

Cited by 658

Need for LWR metrology standardization: the imec roughness protocol

Lorusso, G. F., Sutani, T., Rutigliani, V., van Roey, F., Moussa, A., Charley, A.-L., Mack, C., Naulleau, P., Perera, C., Constantoudis, V., et al. (2018) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesSurface Roughness and Optical Measurements

Cited by 59

Statistical simulation of photoresists at EUV and ArF

Biafore, J. J., Smith, M. D., Mack, C. A., Thackeray, J. W., Gronheid, R., Robertson, S. A., Graves, T., & Blankenship, D. (2009) · SPIE Proceedings

Advancements in Photolithography TechniquesBlock Copolymer Self-Assembly

Cited by 58