Tiwale, Nikhil

Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

Tiwale, N., Subramanian, A., Kisslinger, K., Lu, M., Kim, J., Stein, A., & Nam, C.-Y. (2019) · Journal of Materials Chemistry C

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 78

Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications

Le, D. N., Park, T., Hwang, S. M., Kim, J.-H., Jung, Y. C., Tiwale, N., Subramanian, A., Lee, W.-I., Choi, R., Sung, M. M., et al. (2023) · Japanese Journal of Applied Physics

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 26

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Le, D. N., Hwang, S. M., Woo, J., Choi, S., Park, T., Veyan, J.-F., Tiwale, N. M., Subramanian, A., Lee, W.-I., Nam, C.-Y., et al. (2022) · International Conference on Extreme Ultraviolet Lithography 2022

Advancements in Photolithography TechniquesSemiconductor materials and devices

Cited by 11