Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

Tiwale, Nikhil; Subramanian, Ashwanth; Kisslinger, Kim; Lu, Ming; Kim, Jiyoung; Stein, Aaron; Nam, Chang-Yong

doi:10.1039/c9tc02974e

Cited by 78Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesBlock Copolymer Self-Assembly

The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.

Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

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Tiwale, Nikhil, Subramanian, Ashwanth, Kisslinger, Kim, Lu, Ming, Kim, Jiyoung, Stein, Aaron, Nam, Chang-Yong·2019·Journal of Materials Chemistry C

DOI 10.1039/c9tc02974e

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Abstract

Novel positive-tone hybrid resists developed by vapor-phase inorganic infiltration feature fully tunable resist performance parameters and high-aspect-ratio pattern transfer capability.

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PMMA infiltrated with AlOx as a positive-tone hybrid EUV resist system demonstrated increased etch resistance and process stability through a higher level of cross-linking.
“It also includes innovative applications such as poly methyl methacrylate (PMMA) infiltrated with AlOx as a positive-tone hybrid EUV resist system, which demonstrated increased etch resistance and process stability through a higher level of cross-linking, crucial for advanced patterning techniques [38].”
From Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography (2024) · cites this paper as [38]
VPI applied ex situ to pre-lithography coatings generates hybrid inorganic-organic resist materials, significantly increasing EUV sensitivity and mechanical strength.
“Moreover, VPI has been applied ex situ to pre-lithography coatings (Figure 6b) to generate hybrid inorganic–organic resist materials, significantly increasing EUV sensitivity and mechanical strength of the resists.”
From Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography (2024) · cites this paper as [38]

Vapor phase infiltration (VPI) for transforming polymers into organic–inorganic hybrid materials: A critical review of current progress and future challenges
Leng, C. Z., & Losego, M. D. (2017) · Materials Horizons · doi:10.1039/c7mh00196g · Cited by 224
Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups
Li, L., Chakrabarty, S., Jiang, J., Zhang, B., Ober, C., & Giannelis, E. P. (2016) · Nanoscale · doi:10.1039/c5nr07334k · Cited by 78
Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning
Mattson, E. C., Cabrera, Y., Rupich, S. M., Wang, Y., Oyekan, K. A., Mustard, T. J., Halls, M. D., Bechtel, H. A., Martin, M. C., & Chabal, Y. J. (2018) · Chemistry of Materials · doi:10.1021/acs.chemmater.8b03149 · Cited by 66

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Atomic InOx motif-mediated cross-linking in PMMA via sequential infiltration synthesis for negative-tone lithography
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Authors: Tiwale, N., Subramanian, A., Kisslinger, K., Lu, M., Kim, J., Stein, A., & Nam, C.-Y.
Affiliations: Brookhaven National Laboratory (US)
Stony Brook University (US)
The University of Texas at Dallas (US)
Corresponding author: Nam, Chang-Yong
ORCID: Tiwale, Nikhil
Subramanian, Ashwanth
Kisslinger, Kim
Lu, Ming
Kim, Jiyoung
Stein, Aaron
Nam, Chang-Yong
Venue: Journal of Materials Chemistry C
Publisher: Royal Society of Chemistry (RSC)
Published: 2019
Volume: 7
Issue: 29
Pages: 8803-8812
ISSN: 2050-7526 (ISSN-L)
2050-7534
DOI: 10.1039/c9tc02974e
OpenAlex: W2960993351
Cited by: 78
References: 0
Citations by year: 2026: 19 · 2025: 16 · 2024: 14 · 2023: 6 · 2022: 10 · 2021: 6 · 2020: 5 · 2019: 2
FWCI: 2.07
Type: journal article
Language: en
Open access: green
www.osti.gov
Licence: rsc.li/journals-terms-of-use#chorus (am, 554 d)
Locations: Journal of Materials Chemistry C (publishedVersion)
OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) (submittedVersion)
Funders: Office of Science (DE-SC0012704)
Topics: Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
Physical Sciences › Materials Science › Surfaces, Coatings and Films › Nanofabrication and Lithography Techniques
Physical Sciences › Materials Science › Materials Chemistry › Block Copolymer Self-Assembly
Keywords: nanolithography, positive resist, vapor phase infiltration, high aspect ratio patterning

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Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

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