Sutani, Takumichi

Need for LWR metrology standardization: the imec roughness protocol

Lorusso, G. F., Sutani, T., Rutigliani, V., van Roey, F., Moussa, A., Charley, A.-L., Mack, C., Naulleau, P., Perera, C., Constantoudis, V., et al. (2018) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesSurface Roughness and Optical Measurements

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Enabling CD SEM metrology for 5nm technology node and beyond

Lorusso, G. F., Ohashi, T., Yamaguchi, A., Inoue, O., Sutani, T., Horiguchi, N., Bömmels, J., Wilson, C. J., Briggs, B., Tan, C. L., et al. (2017) · SPIE Proceedings

Advancements in Photolithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis

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