Vockenhuber, Michaela

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

Cardineau, B., Del Re, R., Marnell, M., Al-Mashat, H., Vockenhuber, M., Ekinci, Y., Sarma, C., Freedman, D. A., & Brainard, R. L. (2014) · Microelectronic Engineering

Advancements in Photolithography TechniquesOrganometallic Compounds Synthesis and Characterization

Cited by 202

Improvements in resist performance towards EUV HVM

Yildirim, O., Buitrago, E., Hoefnagels, R., Meeuwissen, M., Wuister, S., Rispens, G., van Oosten, A., Derks, P., Finders, J., Vockenhuber, M., et al. (2017) · SPIE Proceedings

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 69

Extreme ultraviolet lithography reaches 5 nm resolution

Giannopoulos, I., Mochi, I., Vockenhuber, M., Ekinci, Y., & Kazazis, D. (2024) · Nanoscale

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 69

EUV resists based on tin-oxo clusters

Cardineau, B., Del Re, R., Al-Mashat, H., Marnell, M., Vockenhuber, M., Ekinci, Y., Sarma, C., Neisser, M., Freedman, D. A., & Brainard, R. L. (2014) · SPIE Proceedings

Advancements in Photolithography TechniquesOrganometallic Compounds Synthesis and Characterization

Cited by 67

Mixed-ligand zinc-oxoclusters: Efficient chemistry for high resolution nanolithography

Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020) · Journal of Materials Chemistry C

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 52

Mechanistic insights in Zr-and Hf-based molecular hybrid EUV photoresists

Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., Jung, T., Ekinci, Y., & Castellanos Ortega, S. (2019) · Journal of Micro/Nanopatterning Materials and Metrology

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 49

Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers

Lugier, O., Thakur, N., Wu, L., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2021) · ACS Applied Materials & Interfaces

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 13

Advancements in EUV photoresists for high-NA lithography

Develioglu, A., Vockenhuber, M., van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023) · International Conference on Extreme Ultraviolet Lithography 2023

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 12