Extreme ultraviolet lithography reaches 5 nm resolution
Open accessAbstract
Our mirror-based lithographic technique achieves 5 nm half-pitch patterning with EUV light. This breakthrough pushes EUV lithography boundaries beyond the high-NA specifications and serves as a benchmarking platform for novel photoresists.
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Claims other papers make about this one
Each is checked against this paper’s own text: does it say what the citing paper says it does?
5 nm resolution was demonstrated using a mirror-based interference lithography set-up.
“More recently, 5 nm resolution was demonstrated using a mirror-based interference lithography set-up 54 .”
From Extreme ultraviolet lithography (2024) · cites this paper as [54]
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Cites
Henke, B. L., Gullikson, E. M., & Davis, J. C. (1993) · Atomic Data and Nuclear Data Tables · doi:10.1006/adnd.1993.1013 · Cited by 6,313 · see citing works
Cramming More Components Onto Integrated Circuits
Moore, G. E. (1998) · Proceedings of the IEEE · doi:10.1109/jproc.1998.658762 · Cited by 5,954 · see citing works
Nanoimprint Lithography: Methods and Material Requirements
Guo, L. J. (2007) · Advanced Materials · doi:10.1002/adma.200600882 · Cited by 1,844 · see citing works
Chou, S. Y., Krauss, P. R., & Renstrom, P. J. (1996) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.588605 · Cited by 1,736 · see citing works
Advanced scanning probe lithography
Garcia, R. A., Knoll, A. W., & Riedo, E. (2014) · Nature Nanotechnology · doi:10.1038/nnano.2014.157 · Cited by 660 · see citing works
Focused ion beam technology and applications
Melngailis, J. (1987) · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · doi:10.1116/1.583937 · Cited by 620 · see citing works
Sub-50 nm period patterns with EUV interference lithography
Solak, H. H., David, C., Gobrecht, J., et al. (2003) · Microelectronic Engineering · doi:10.1016/s0167-9317(03)00059-5 · Cited by 195 · see citing works
Levinson, H. (2010) · SPIE eBooks · doi:10.1117/3.865363 · Cited by 178 · see citing works
Sub-10 nm patterning using EUV interference lithography
Päivänranta, B., Langner, A., Kirk, E. C., Dávid, C., & Ekinci, Y. (2011) · Nanotechnology · doi:10.1088/0957-4484/22/37/375302 · Cited by 173 · see citing works
Self-citationBilayer Al wire-grids as broadband and high-performance polarizers
Ekinci, Y., Solak, H. H., David, C., et al. (2006) · Optics Express · doi:10.1364/oe.14.002323 · Cited by 171 · see citing works
Self-citationNano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations
Namatsu, H., Yamaguchi, T., Nagase, M., et al. (1998) · Microelectronic Engineering · doi:10.1016/s0167-9317(98)00076-8 · Cited by 164 · see citing works
Thermal scanning probe lithography—a review
Howell, S. T., Grushina, A. L., Holzner, F., et al. (2020) · Microsystems & Nanoengineering · doi:10.1038/s41378-019-0124-8 · Cited by 164 · see citing works
Beyond EUV lithography: a comparative study of efficient photoresists' performance
Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015) · Scientific Reports · doi:10.1038/srep09235 · Cited by 162 · see citing works
Self-citationLithography with the scanning tunneling microscope
McCord, M. A., & Pease, R. F. W. (1986) · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · doi:10.1116/1.583400 · Cited by 152 · see citing works
(2015) · Frontiers of nanoscience · doi:10.1016/b978-0-08-100086-1.21002-6 · Cited by 129 · see citing works
Lithography for robust and editable atomic-scale silicon devices and memories
Achal, R., Rashidi, M., Croshaw, J., Churchill, D. G., Taucer, M., Huff, T. R., Cloutier, M., Pitters, J., & Wolkow, R. A. (2018) · Nature Communications · doi:10.1038/s41467-018-05171-y · Cited by 128 · see citing works
Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography
Solak, H. H., He, D., Li, W., et al. (1999) · Applied Physics Letters · doi:10.1063/1.125005 · Cited by 120 · see citing works
Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications
Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015) · Microelectronic Engineering · doi:10.1016/j.mee.2015.03.047 · Cited by 114 · see citing works
Self-citationAtomic force microscopy lithography as a nanodevice development technique
Notargiacomo, A., Foglietti, V., Cianci, E., et al. (1999) · Nanotechnology · doi:10.1088/0957-4484/10/4/317 · Cited by 109 · see citing works
Immersion lithography and its impact on semiconductor manufacturing
Lin, B. J. (2004) · Journal of Micro/Nanopatterning Materials and Metrology · doi:10.1117/1.1756917 · Cited by 92 · see citing works
20nm Line/space patterns in HSQ fabricated by EUV interference lithography
Ekinci, Y., Solak, H. H., Padeste, C., et al. (2007) · Microelectronic Engineering · doi:10.1016/j.mee.2007.01.213 · Cited by 72 · see citing works
Self-citationImmersion lithography; its potential performance and issues
Owa, S., & Nagasaka, H. (2003) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.504599 · Cited by 68 · see citing works
High-resolution and large-area nanoparticle arrays using EUV interference lithography
Karim, W., Tschupp, S. A., Oezaslan, M., et al. (2015) · Nanoscale · doi:10.1039/c5nr00565e · Cited by 66 · see citing works
Fast proximity correction with zone sampling
Stirniman, J. P., & Rieger, M. L. (1994) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.175423 · Cited by 54 · see citing works
Nanopatterning of gold colloids for label-free biosensing
Städler, B., Solak, H. H., Frerker, S., et al. (2007) · Nanotechnology · doi:10.1088/0957-4484/18/15/155306 · Cited by 47 · see citing works
Ge quantum dot molecules and crystals: Preparation and properties
Dais, C., Solak, H. H., Ekinci, Y., et al. (2006) · Surface Science · doi:10.1016/j.susc.2006.12.053 · Cited by 38 · see citing works
Self-citationChemically Functionalized Carbon Nanosieves with 1‐nm Thickness
Schnietz, M., Turchanin, A., Nottbohm, C. T., et al. (2009) · Small · doi:10.1002/smll.200901283 · Cited by 37 · see citing works
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
Fan, D., & Ekinci, Y. (2016) · Journal of Micro/Nanopatterning, Materials, and Metrology · doi:10.1117/1.jmm.15.3.033505 · Cited by 35 · see citing works
Self-citationFabrication of quasiperiodic nanostructures with EUV interference lithography
Langner, A., Päivänranta, B., Terhalle, B., et al. (2012) · Nanotechnology · doi:10.1088/0957-4484/23/10/105303 · Cited by 32 · see citing works
Winter, A., Ekinci, Y., Gölzhäuser, A., et al. (2019) · 2D Materials · doi:10.1088/2053-1583/ab0014 · Cited by 31 · see citing works
Self-citationRaley, A., Thibaut, S., Mohanty, N. R., et al. (2016) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2219321 · Cited by 24 · see citing works
Groves, T. R. (2014) · Elsevier eBooks · doi:10.1533/9780857098757.80 · Cited by 24 · see citing works
Functionalization of fluoropolymer surfaces with nanopatterned polyelectrolyte brushes
Neuhaus, S., Padeste, C., Solak, H. H., et al. (2010) · Polymer · doi:10.1016/j.polymer.2010.07.002 · Cited by 23 · see citing works
Daoulas, K. C., Müller, M., Stoykovich, M. P., et al. (2006) · Journal of Polymer Science Part B Polymer Physics · doi:10.1002/polb.20904 · Cited by 21 · see citing works
Novel High Sensitivity EUV Photoresist for Sub-7 nm Node
Nagai, T., Nakagawa, H., Naruoka, T., et al. (2016) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.29.475 · Cited by 19 · see citing works
Solak, H. H., & Ekinci, Y. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2799974 · Cited by 17 · see citing works
Self-citationA 6.7-nm beyond EUV source as a future lithography source
Otsuka, T. P., Li, B., O'Gorman, C., et al. (2012) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.916351 · Cited by 17 · see citing works
Thermal probe nanolithography: in-situ inspection, high-speed, high-resolution, 3D
Holzner, F., Paul, P., Despont, M., et al. (2013) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2032318 · Cited by 16 · see citing works
High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers
Wang, X., Kazazis, D., Tseng, L.-T., Robinson, A. P. G., & Ekinci, Y. (2022) · Nanotechnology · doi:10.1088/1361-6528/ac328b · Cited by 15 · see citing works
Self-citationAdvanced holographic methods in extreme ultraviolet interference lithography
Terhalle, B., Langner, A., Päivänranta, B., et al. (2011) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.893733 · Cited by 14 · see citing works
Lloyd’s mirror interference lithography with EUV radiation from a high-harmonic source
Kim, H., Baksh, P. D., Odstrčil, M., et al. (2016) · Applied Physics Express · doi:10.7567/apex.9.076701 · Cited by 14 · see citing works
Gottlieb, S., Kazazis, D., Mochi, I., Evangelio, L., Fernández-Regúlez, M., Ekinci, Y., & Pérez‐Murano, F. (2018) · Soft Matter · doi:10.1039/c8sm01045e · Cited by 13 · see citing works
Self-citationDevelopment of a high-power EUV irradiation tool in a hydrogen atmosphere
Harada, T., Yamakawa, S., Toyoda, M., et al. (2021) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/ac15ef · Cited by 10 · see citing works
Kulmala, T. S., Vockenhuber, M., Buitrago, E., et al. (2015) · Journal of Micro/Nanopatterning Materials and Metrology · doi:10.1117/1.jmm.14.3.033507 · Cited by 9 · see citing works
Self-citationStudying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L., Kazazis, D., et al. (2019) · Journal of Micro/Nanopatterning Materials and Metrology · doi:10.1117/1.jmm.18.1.013501 · Cited by 8 · see citing works
Self-citationRonse, K. G., de Beeck, M. O., den hove, L. V., et al. (1994) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.587395 · Cited by 6 · see citing works
Flagged first, then by citations
Research works printed but not linked: 55
- G. E. Moore, Proc. IEEE, 1998, 86, 82-85.
- T. R. Groves, in Nanolithography, ed. M. Feldman, Woodhead Publishing, 2014, ch. 3, pp. 80-115.
- J. Melngailis, J. Vac. Sci. Technol., B: Microelectron. Process. Phenom., 1987, 5, 469-495.
- S. Y. Chou, P. R. Krauss and P. J. Renstrom, J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.-Process., Meas., Phenom., 1996, 14, 4129-4133.
- L. J. Guo, Adv. Mater., 2007, 19, 495-513.
- A. Notargiacomo, V. Foglietti, E. Cianci, G. Capellini, M. Adami, P. Faraci, F. Evangelisti and C. Nicolini, Nanotechnology, 1999, 10, 458.
- S. T. Howell, A. Grushina, F. Holzner and J. Brugger, Microsyst. Nanoeng., 2020, 6, 21.
- F. Holzner, P. Paul, M. Despont, L. L. Cheong, J. Hedrick, U. Dürig and A. Knoll, Proc. SPIE, 2013, 8886, 888605.
- R. Garcia, A. W. Knoll and E. Riedo, Nat. Nanotechnol., 2014, 9, 577-587.
- M. A. McCord and R. F. W. Pease, J. Vac. Sci. Technol., B: Microelectron. Process. Phenom., 1986, 4, 86-88.
- R. Achal, M. Rashidi, J. Croshaw, D. Churchill, M. Taucer, T. Huff, M. Cloutier, J. Pitters and R. A. Wolkow, Nat. Commun., 2018, 9, 2778.
- D. M. Tennant, in Nanotechnology, ed. G. Timp, Springer New York, New York, NY, 1999, ch. 4, p. 164.
- P. P. Naulleau, J. E. Bjorkholm and M. Chandhok, in EUV Lithography, ed. V. Kakshi, SPIE Press, 2009, ch. 11.
- S. Wurm and C. Gwyn, in EUV Lithography, ed. V. Bakshi, SPIE Press, 2009, ch. 2.
- P. J. Stirniman and L. M. Rieger, Proc. SPIE, 1994, 2197, 294-301.
- K. Ronse, M. Op de Beeck, L. Van den hove and J. Engelen, J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.- Process., Meas., Phenom., 1994, 12, 589-600.
- A. Raley, S. Thibaut, N. Mohanty, K. Subhadeep, S. Nakamura, A. Ko, D. O'Meara, K. Tapily, S. Consiglio and P. Biolsi, Proc. SPIE, 2016, 9782, 97820F.
- B.-J. Lin, J. Micro/Nanolithogr., MEMS, MOEMS, 2004, 3, 377-500.
- S. Owa and H. Nagasaka, Proc. SPIE, 2003, 5040, 724-733.
- T. Harada, S. Yamakawa, M. Toyoda and T. Watanabe, Jpn. J. Appl. Phys., 2021, 60, 087005.
- M. van de Kerkhof, A. Yakunin, V. Kvon, F. van de Wetering, S. Cats, L. Heijmans, A. Nikipelov, A. Lassise and V. Banine, Proc. SPIE, 2020, 11323, 113230Y.
- J. Van Schoot, S. Lok, E. van Setten, R. Maas, K. Troost, R. Peeters, J. Finders, J. Stoeldraijer, J. Benschop, P. Graeupner, P. Kuerz and W. Kaiser, Proc. SPIE, 2021, 11517, 1151712.
- I. Lee, J.-H. Franke, V. Philipsen, K. Ronse, S. De Gendt and E. Hendrickx, Proc. SPIE, 2023, 12494, 1249405.
- J. Van Schoot, E. van Setten, K. Troost, S. Lok, J. Stoeldraijer, R. Peeters, J. Benschop, J. Zimmerman, P. Graeupner, L. Wischmeier, P. Kuerz and W. Kaiser, Proc. SPIE, 2020, 11323, 1132307.
- K. Umstadter, M. Graham, M. Purvis, A. Schafgans, J. Stewart, P. Mayer and D. Brown, Proc. SPIE, 2023, 12494, 124940Z.
- Y. Ekinci, H. H. Solak, C. Padeste, J. Gobrecht, M. P. Stoykovich and P. F. Nealey, Microelectron. Eng., 2007, 84, 700-704.
- B. Paivanranta, A. Langner, E. Kirk, C. David and Y. Ekinci, Nanotechnology, 2011, 22, 375302.
- E. Buitrago, O. Yildirim, C. Verspaget, N. Tsugama, R. Hoefnagels, G. Rispens and Y. Ekinci, Proc. SPIE, 2015, 9422, 94221S.
- T. Allenet, M. Vockenhuber, C. K. Yeh, D. Kazazis, J. G. Santaclara, L. v. Lent-Protasova and Y. Ekinci, Proc. SPIE, 2021, 11854, 118540N.
- A. Develioglu, P. T. Allenet, M. Vockenhuber, L. van Lent- Protasova, I. Mochi, Y. Ekinci and D. Kazazis, Proc. SPIE, 2023, 12498, 1249805.
- B. Terhalle, A. Langner, B. Päivänranta and Y. Ekinci, Proc. SPIE, 2011, 8102, 81020V.
- A. Langner, B. Päivänranta, B. Terhalle and Y. Ekinci, Nanotechnology, 2012, 23, 105303.
- B. L. Henke, E. M. Gullikson and J. C. Davis, At. Data Nucl. Data Tables, 1993, 54, 181-342.
- D. Fan and Y. Ekinci, J. Micro/Nanolithogr., MEMS, MOEMS, 2016, 15, 033505.
- T. S. Kulmala, M. Vockenhuber, E. Buitrago, R. Fallica and Y. Ekinci, J. Micro/Nanolithogr., MEMS, MOEMS, 2015, 14, 033507.
- T. Nagai, H. Nakagawa, T. Naruoka, S. Dei, S. Tagawa, A. Oshima, S. Nagahara, G. Shiraishi, K. Yoshihara, Y. Terashita, Y. Minekawa, E. Buitrago, Y. Ekinci, O. Yildirim, M. Meeuwissen, R. Hoefnagels, G. Rispens, C. Verspaget and R. Maas, J. Photopolym. Sci. Technol., 2016, 29, 475-478.
- C. Dais, H. H. Solak, Y. Ekinci, E. Müller, H. Sigg and D. Grützmacher, Surf. Sci., 2007, 601, 2787- 2791.
- S. Gottlieb, D. Kazazis, I. Mochi, L. Evangelio, M. Fernández-Regúlez, Y. Ekinci and F. Perez-Murano, Soft Matter, 2018, 14, 6799-6808.
- S. Neuhaus, C. Padeste, H. H. Solak and N. D. Spencer, Polymer, 2010, 51, 4037-4043.
- W. Karim, S. A. Tschupp, M. Oezaslan, T. J. Schmidt, J. Gobrecht, J. A. van Bokhoven and Y. Ekinci, Nanoscale, 2015, 7, 7386-7393.
- A. Winter, Y. Ekinci, A. Gölzhäuser and A. Turchanin, 2D Mater., 2019, 6, 021002.
- M. Schnietz, A. Turchanin, C. T. Nottbohm, A. Beyer, H. H. Solak, P. Hinze, T. Weimann and A. Gölzhäuser, Small, 2009, 5, 2651-2655.
- H. H. Solak and Y. Ekinci, J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.-Process., Meas., Phenom., 2007, 25, 2123-2126.
- B. Städler, H. H. Solak, S. Frerker, K. Bonroy, F. Frederix, J. Vörös and H. M. Grandin, Nanotechnology, 2007, 18, 155306.
- K. C. Daoulas, M. Müller, M. P. Stoykovich, Y. J. Papakonstantopoulos, J. J. de Pablo, P. F. Nealey, S.-M. Park and H. H. Solak, J. Polym. Sci., Part A: Polym. Chem., 2006, 44, 2589-2604.
- Y. Ekinci, H. H. Solak, C. David and H. Sigg, Opt. Express, 2006, 14, 2323-2334.
- X. Wang, D. Kazazis, L.-T. Tseng, A. P. G. Robinson and Y. Ekinci, Nanotechnology, 2021, 33, 065301.
- J.-M. Park, W. Leung, K. Constant, T.-G. Kim and K.-M. Ho, in Nanowires, ed. H. Abbass, IntechOpen, Rijeka, 2011, ch. 21, pp. 472-474.
- H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang and P. Nealey, Appl. Phys. Lett., 1999, 75, 2328-2330.
- H. Kim, P. Baksh, M. Odstrcil, M. Miszczak, J. G. Frey, L. Juschkin and W. S. Brocklesby, Appl. Phys. Express, 2016, 9, 076701.
- N. Mojarad, J. Gobrecht and Y. Ekinci, Microelectron. Eng., 2015, 143, 55-63.
- X. Wang, L.-T. Tseng, D. Kazazis, Z. Tasdemir, M. Vockenhuber, I. Mochi and Y. Ekinci, J. Micro/ Nanolithogr., MEMS, MOEMS, 2019, 18, 013501.
- Z. Tasdemir, I. Mochi, K. G. Olvera, M. Meeuwissen, O. Yildirim, R. Custers, R. Hoefnagels, G. Rispens, R. Fallica, M. Vockenhuber and Y. Ekinci, Proc. SPIE, 2017, 10450, 104501T.
- T. Otsuka, B. Li, C. O'Gorman, C. Thomas, D. Kilbane, T. Higashiguchi, N. Yugami, W. Jiang, A. Endo, P. Dunne and G. O'Sullivan, Proc. SPIE, 2012, 8322, 832214.
- N. Mojarad, J. Gobrecht and Y. Ekinci, Sci. Rep., 2015, 5, 9235.
Cited by
Sorted by citations
Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149 · see citing works
Self-citation
- Authors
- Giannopoulos, I., Mochi, I., Vockenhuber, M., Ekinci, Y., & Kazazis, D.
- Affiliations
- Paul Scherrer Institute (CH)
- Corresponding author
- Giannopoulos, Iason
- Kazazis, Dimitrios
- Venue
- Nanoscale
- Publisher
- Royal Society of Chemistry (RSC)
- Published
- 2024
- Volume
- 16
- Issue
- 33
- Pages
- 15533-15543
- ISSN
- 2040-3364 (ISSN-L)
- 2040-3372
- OpenAlex
- W4401516118
- Cited by
- 69
- References
- 46
- Citations by year
- 2026: 36 · 2025: 31 · 2024: 2
- FWCI
- 7.15
- Type
- journal article
- Language
- en
- Open access
- hybrid
- doi.org
- Licence
- Locations
- Nanoscale (publishedVersion, cc-by-nc)
- PubMed (publishedVersion)
- arXiv (Cornell University) (submittedVersion, cc-by)
- DORA PSI (Paul Scherrer Institute) (submittedVersion, cc-by-nc)
- Figshare (submittedVersion, cc-by)
- arXiv (Cornell University) (cc-by)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Physical Sciences › Engineering › Biomedical Engineering › Nanofabrication and Lithography Techniques
- Keywords
- EUV lithography, line/space patterning, diffraction efficiency, sub-10 nm patterning, EUV resist
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
