Kozawa, Takahiro

Radiation Chemistry in Chemically Amplified Resists

Kozawa, T., & Tagawa, S. (2010) · Japanese Journal of Applied Physics

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 360

Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking

Naqvi, B. A., Enomoto, S., Machida, K., Takata, Y., Kozawa, T., Muroya, Y., De Gendt, S., & De Simone, D. (2024) · Chemistry of Materials

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 29

Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

Takei, S., Oshima, A., Ichikawa, T., Sekiguchi, A., Kashiwakura, M., Kozawa, T., Tagawa, S., Oyama, T. G., Ito, S., & Miyasaka, H. (2014) · Microelectronic Engineering

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 28