The DOI matches its Crossref record; 221 of the 221 references it cites were found in a registry or an index.
Radiation Chemistry in Chemically Amplified Resists
Open accessAbstract
Historically, in the mass production of semiconductor devices, exposure tools have been repeatedly replaced with those with a shorter wavelength to meet the resolution requirements projected in the International Technology Roadmap for Semiconductors issued by the Semiconductor Industry Association. After ArF immersion lithography, extreme ultraviolet (EUV; 92.5 eV) radiation is expected to be used as an exposure tool for the mass production at or below the 22 nm technology node. If realized, 92.5 eV EUV will be the first ionizing radiation used for the mass production of semiconductor devices. In EUV lithography, chemically amplified resists, which have been the standard resists for mass production since the use of KrF lithography, will be used to meet the sensitivity requirement. Above the ionization energy of resist materials, the fundamental science of imaging, however, changes from photochemistry to radiation chemistry. In this paper, we review the radiation chemistry of materials related to chemically amplified resists. The imaging mechanisms from energy deposition to proton migration in resist materials are discussed.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Claims other papers make about this one
Each is checked against this paper’s own text: does it say what the citing paper says it does?
The cascade of secondary electrons leads to chemical reactions when using EUV radiation.
“This cascade of secondary electrons leads to chemical reactions when using EUV radiation.”
From Extreme ultraviolet lithography (2024) · cites this paper as [57]
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cites
Henke, B. L., Gullikson, E. M., & Davis, J. C. (1993) · Atomic Data and Nuclear Data Tables · doi:10.1006/adnd.1993.1013 · Cited by 6,386
Tanuma, S., Powell, C. J., & Penn, D. R. (1994) · Surface and Interface Analysis · doi:10.1002/sia.740210302 · Cited by 2,823
Onsager, L. (1938) · Physical Review · doi:10.1103/physrev.54.554 · Cited by 1,889
Lias, S. G., Liebman, J. F., & Levin, R. D. (1984) · Journal of Physical and Chemical Reference Data · doi:10.1063/1.555719 · Cited by 1,329
Radiation chemistry of polymeric systems
CHAPIRO, A. (1962) · Interscience eBooks · Cited by 1,156
Proximity effect in electron-beam lithography
Chang, T. H. P. (1975) · Journal of Vacuum Science and Technology · doi:10.1116/1.568515 · Cited by 550
BORDWELL, F. G., & Cheng, J. (1991) · Journal of the American Chemical Society · doi:10.1021/ja00005a042 · Cited by 465
Chemical amplification in the design of dry developing resist materials
Itô, H., & Willson, C. G. (1983) · Polymer Engineering and Science · doi:10.1002/pen.760231807 · Cited by 463
Chemical Amplification Resists for Microlithography
Ito, H. (2005) · Advances in polymer science · doi:10.1007/b97574 · Cited by 434
Land, E. J., & Ebert, M. (1967) · Transactions of the Faraday Society · doi:10.1039/tf9676301181 · Cited by 356
Dixon, W. T., & Murphy, D. (1976) · Journal of the Chemical Society Faraday Transactions 2 Molecular and Chemical Physics · doi:10.1039/f29767201221 · Cited by 282
O’Neill, P., Steenken, S., & Schulte‐Frohlinde, D. (1975) · The Journal of Physical Chemistry · doi:10.1021/j100592a013 · Cited by 272
Chen, W., & Ahmed, H. (1993) · Applied Physics Letters · doi:10.1063/1.109609 · Cited by 271
Photochemistry of triarylsulfonium salts
Dektar, J. L., & Hacker, N. P. (1990) · Journal of the American Chemical Society · doi:10.1021/ja00172a015 · Cited by 271
Resist blur and line edge roughness
Gallatin, G. M. (2005) · Optical Microlithography XVIII · doi:10.1117/12.607233 · Cited by 251
Kozawa, T., Yoshida, Y., & Tagawa, M. U. (1992) · Japanese Journal of Applied Physics · doi:10.1143/jjap.31.4301 · Cited by 248
Self-citationPhotochemistry of diaryliodonium salts
Dektar, J. L., & Hacker, N. P. (1990) · The Journal of Organic Chemistry · doi:10.1021/jo00289a045 · Cited by 213
Land, E. J., Porter, G., & Strachan, E. (1961) · Transactions of the Faraday Society · doi:10.1039/tf9615701885 · Cited by 209
Monte Carlo simulation of fast secondary electron production in electron beam resists
Murata, K., Kyser, D. F., & Ting, C. H. (1981) · Journal of Applied Physics · doi:10.1063/1.329366 · Cited by 176
Proton Dynamics in Chemically Amplified Electron Beam Resists
Yamamoto, H., Kozawa, T., Nakano, A., Okamoto, K., Yamamoto, Y., Ando, T., Satô, M., Komano, H., & Tagawa, S. (2004) · Japanese Journal of Applied Physics · doi:10.1143/jjap.43.l848 · Cited by 169
Self-citationYasin, S., Hasko, D. G., & Ahmed, H. (2001) · Applied Physics Letters · doi:10.1063/1.1369615 · Cited by 165
Hinsberg, W. D., Houle, F. A., Hoffnagle, J. A., et al. (1998) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.590392 · Cited by 162
Rishton, S. A., & Kern, D. P. (1987) · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · doi:10.1116/1.583847 · Cited by 155
Acid distribution in chemically amplified extreme ultraviolet resist
Kozawa, T., Tagawa, S., Cao, H. B., et al. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2794063 · Cited by 152
Self-citationEnergy dissipation in a thin polymer film by electron beam scattering
Hawryluk, R. J., Hawryluk, A. M., & Smith, H. I. (1974) · Journal of Applied Physics · doi:10.1063/1.1663629 · Cited by 144
Land, E. J., & Porter, G. (1963) · Transactions of the Faraday Society · doi:10.1039/tf9635902016 · Cited by 138
Radiation and photochemistry of onium salt acid generators in chemically amplified resists
Tagawa, S., Nagahara, S., Iwamoto, T., et al. (2000) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.388304 · Cited by 132
Self-citationYamamoto, H., Kozawa, T., Nakano, A., et al. (2005) · Japanese Journal of Applied Physics · doi:10.1143/jjap.44.5836 · Cited by 131
Self-citationPicosecond Pulse Radiolysis Studies. II. Reactions of Electrons with Concentrated Scavengers
Wolff, R. K., Bronskill, M. J., & HUNT, J. W. (1970) · The Journal of Chemical Physics · doi:10.1063/1.1673923 · Cited by 129
Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes
Kozawa, T., Saeki, A., & Tagawa, S. (2004) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1823435 · Cited by 128
Self-citationAcid generation efficiency in a model system of chemically amplified extreme ultraviolet resist
Kozawa, T., Tagawa, S., Oizumi, H., et al. (2006) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2393297 · Cited by 125
Self-citationProtonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
Natsuda, K., Kozawa, T., Okamoto, K., et al. (2006) · Japanese Journal of Applied Physics · doi:10.1143/jjap.45.l1256 · Cited by 122
Self-citationTorikai, A., Ohno, M., & Fueki, K. (1990) · Journal of Applied Polymer Science · doi:10.1002/app.1990.070410513 · Cited by 122
Porter, G., & Wright, F. J. (1955) · Transactions of the Faraday Society · doi:10.1039/tf9555101469 · Cited by 121
Lam, K. Y., & HUNT, J. W. (1975) · International Journal for Radiation Physics and Chemistry · doi:10.1016/0020-7055(75)90072-8 · Cited by 120
Hinsberg, W. D., Houle, F. A., Sanchez, M. I., & Wallraff, G. M. (2001) · IBM Journal of Research and Development · doi:10.1147/rd.455.0667 · Cited by 120
Li, D., & Brisson, J. (1998) · Polymer · doi:10.1016/s0032-3861(97)00371-6 · Cited by 115
Model for the radiolysis of water
Hamill, W. H. (1969) · The Journal of Physical Chemistry · doi:10.1021/j100725a027 · Cited by 113
Study of Acid-Base Equilibrium in Chemically Amplified Resist
Natsuda, K., Kozawa, T., Okamoto, K., et al. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.7285 · Cited by 113
Self-citationThe reaction of the precursor of the hydrated electron with electron scavengers
Jonah, C. D., Miller, J. R. A., & Matheson, M. S. (1977) · The Journal of Physical Chemistry · doi:10.1021/j100532a003 · Cited by 111
Gupta, A., Liang, R. H., Tsay, F. D., et al. (1980) · Macromolecules · doi:10.1021/ma60078a060 · Cited by 110
Generation, Characterization, and Deprotonation of Phenol Radical Cations
Gadosy, T. A., Shukla, D., & Johnston, L. J. (1999) · The Journal of Physical Chemistry A · doi:10.1021/jp992216x · Cited by 108
Hirose, R., Kozawa, T., Tagawa, S., et al. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.l979 · Cited by 108
Self-citationKozawa, T., Nagahara, S., Yoshida, Y., et al. (1997) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.589689 · Cited by 105
Self-citationNanometer-scale linewidth fluctuations caused by polymer aggregates in resist films
Yamaguchi, T., Namatsu, H., Nagase, M., et al. (1997) · Applied Physics Letters · doi:10.1063/1.120037 · Cited by 105
Energy deposition functions in electron resist films on substrates
Parikh, M., & Kyser, D. F. (1979) · Journal of Applied Physics · doi:10.1063/1.326088 · Cited by 102
Analysis of acid yield generated in chemically amplified electron beam resist
Kozawa, T., Shigaki, T., Okamoto, K., et al. (2006) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2366656 · Cited by 100
Self-citationCumming, D. R. S., Thoms, S., Beaumont, S. P., et al. (1996) · Applied Physics Letters · doi:10.1063/1.116073 · Cited by 95
Free electron transfer from several phenols to radical cations of non-polar solvents
Ganapathi, M. R., Hermann, R., Naumov, S., et al. (2000) · Physical Chemistry Chemical Physics · doi:10.1039/b005864p · Cited by 94
Brede, O., Orthner, H., Zubarev, V. E., et al. (1996) · The Journal of Physical Chemistry · doi:10.1021/jp953526s · Cited by 91
Nano edge roughness in polymer resist patterns
Yoshimura, T., Shiraishi, H., Yamamoto, J., et al. (1993) · Applied Physics Letters · doi:10.1063/1.109901 · Cited by 90
Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
Yoshimura, T., Shiraishi, H., Yamamoto, J. Y. J., et al. (1993) · Japanese Journal of Applied Physics · doi:10.1143/jjap.32.6065 · Cited by 89
Resist line edge roughness and aerial image contrast
Shin, J., Han, G., Ma, Y., et al. (2001) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1418413 · Cited by 89
Abell, G. C., & Funabashi, K. (1973) · The Journal of Chemical Physics · doi:10.1063/1.1679289 · Cited by 88
Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography
Nakamura, J., Ban, H., Deguchi, K., et al. (1991) · Japanese Journal of Applied Physics · doi:10.1143/jjap.30.2619 · Cited by 84
Picosecond Pulse Radiolysis. III. Reaction Rates and Reduction in Yields of Hydrated Electrons
Aldrich, J. E., Bronskill, M. J., Wolff, R. K., et al. (1971) · The Journal of Chemical Physics · doi:10.1063/1.1675784 · Cited by 82
Baciocchi, E., Giacco, T. D., & Elisei, F. (1993) · Journal of the American Chemical Society · doi:10.1021/ja00079a008 · Cited by 82
Jönsson, M., Lind, J., Reitberger, T., Eriksen, T. E., & Merényi, G. (1993) · The Journal of Physical Chemistry · doi:10.1021/j100145a027 · Cited by 81
Ionization Yields in Gases under Electron Irradiation
Inokuti, M. (1975) · Radiation Research · doi:10.2307/3574165 · Cited by 80
Nakano, A., Kozawa, T., Okamoto, K., et al. (2006) · Japanese Journal of Applied Physics · doi:10.1143/jjap.45.6866 · Cited by 79
Self-citationComputer simulation of ion recombination in irradiated nonpolar liquids
Bartczak, W. M., & Hummel, A. (1987) · The Journal of Chemical Physics · doi:10.1063/1.453690 · Cited by 79
Line-edge roughness in sub-0.18-μm resist patterns
Palmateer, S. C., Cann, S. G., Curtin, J. E., et al. (1998) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.312395 · Cited by 77
Clifford, P., Green, N. J. B., & Pilling, M. J. (1982) · The Journal of Physical Chemistry · doi:10.1021/j100397a021 · Cited by 76
Determination of acid diffusion in chemical amplification positive deep ultraviolet resists
Schlegel, L., Ueno, T., Hayashi, N., et al. (1991) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.585607 · Cited by 75
Saeki, A., Kozawa, T., Yoshida, Y., et al. (2002) · Japanese Journal of Applied Physics · doi:10.1143/jjap.41.4213 · Cited by 75
Self-citationNitrobenzyl ester chemistry for polymer processes involving chemical amplification
Houlihan, F. M., Shugard, A., Gooden, R., et al. (1988) · Macromolecules · doi:10.1021/ma00185a019 · Cited by 74
Michaelson, T. B., Pawloski, A. R., Acheta, A., et al. (2005) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.599848 · Cited by 72
Microlithography · Molecular Imprinting
(2005) · Advances in polymer science · doi:10.1007/b14099 · Cited by 71
Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists
Yamamoto, H., Kozawa, T., Tagawa, S., et al. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.l142 · Cited by 71
Self-citationButyagin, P. Y., Dubinskaya, A. M., & Радциг, В. А. (1969) · Russian Chemical Reviews · doi:10.1070/rc1969v038n04abeh001742 · Cited by 67
Kozawa, T., Saeki, A., Nakano, A., et al. (2003) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1619959 · Cited by 66
Self-citationHirose, R., Kozawa, T., Tagawa, S., et al. (2008) · Applied Physics Express · doi:10.1143/apex.1.027004 · Cited by 66
Self-citationWolff, R. K., Aldrich, J. E., Penner, T. L., et al. (1975) · The Journal of Physical Chemistry · doi:10.1021/j100570a005 · Cited by 64
Kozawa, T., Tagawa, S., & Shell, M. K. (2008) · Journal of Applied Physics · doi:10.1063/1.2909275 · Cited by 64
Self-citationLaser Flash Photolysis Study of Two Aromatic N-Oxyimidosulfonate Photoacid Generators
Ortica, F., Scaiano, J. C., Pohlers, G., et al. (2000) · Chemistry of Materials · doi:10.1021/cm990440t · Cited by 64
Isotopic dependence of recombination kinetics in water
Chernovitz, A. C., & Jonah, C. D. (1988) · The Journal of Physical Chemistry · doi:10.1021/j100332a021 · Cited by 63
New Photoresist Based on Amorphous Low Molecular Weight Polyphenols
Hirayama, T., Shiono, D., Hada, H., et al. (2004) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.17.435 · Cited by 63
Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists
Yamamoto, H., Nakano, A., Okamoto, K., et al. (2004) · Japanese Journal of Applied Physics · doi:10.1143/jjap.43.3971 · Cited by 62
Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
Okamoto, K., Saeki, A., Kozawa, T., et al. (2003) · Chemistry Letters · doi:10.1246/cl.2003.834 · Cited by 61
Self-citationShimizu, R., Ikuta, T., Everhart, T. E., et al. (1975) · Journal of Applied Physics · doi:10.1063/1.321759 · Cited by 61
Ichikawa, T., & Yoshida, H. (1990) · Journal of Polymer Science Part A Polymer Chemistry · doi:10.1002/pola.1990.080280519 · Cited by 59
Development of subpicosecond pulse radiolysis system
Kozawa, T., Mizutani, Y., Miki, M., et al. (2000) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/s0168-9002(99)00997-3 · Cited by 58
Self-citationInfluence of molecular weight of resist polymers on surface roughness and line-edge roughness
Yamaguchi, T., Yamazaki, K., & Namatsu, H. (2004) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1805546 · Cited by 58
Kozawa, T., Saeki, A., Yoshida, Y., et al. (2002) · Japanese Journal of Applied Physics · doi:10.1143/jjap.41.4208 · Cited by 57
Self-citationKozawa, T., Tagawa, S., Kai, T., et al. (2007) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.20.577 · Cited by 57
Self-citationSchlesener, C. J., & Kochi, J. K. (1984) · The Journal of Organic Chemistry · doi:10.1021/jo00191a019 · Cited by 56
Aktary, M., Stepanova, M., & Dew, S. K. (2006) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2181580 · Cited by 55
Fowles, P. S. (1971) · Transactions of the Faraday Society · doi:10.1039/tf9716700428 · Cited by 55
The Use of Aluminum Chloride-Nitromethane for the Production of Cation Radicals1
Forbes, W. F., & Sullivan, P. D. (1966) · Journal of the American Chemical Society · doi:10.1021/ja00964a051 · Cited by 54
Kozawa, T., Tagawa, S., Santillan, J. J., et al. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2794326 · Cited by 53
Self-citationKozawa, T., & Tagawa, S. (2006) · Journal of Applied Physics · doi:10.1063/1.2173689 · Cited by 52
Self-citationEnhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
Yamamoto, H., Kozawa, T., Tagawa, S., et al. (2008) · Applied Physics Express · doi:10.1143/apex.1.047001 · Cited by 51
Self-citationDetermination of acid dissociation constants of some phenol radical cations
Dixon, W. T., & Murphy, D. (1978) · Journal of the Chemical Society Faraday Transactions 2 Molecular and Chemical Physics · doi:10.1039/f29787400432 · Cited by 51
Resonance Raman spectra of p-benzosemiquinone radical and hydroquinone radical cation
Tripathi, G., & SCHULER, R. H. (1987) · The Journal of Physical Chemistry · doi:10.1021/j100307a014 · Cited by 50
Hinsberg, W. D., Houle, F. A., Sanchez, M. I., et al. (2000) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.388294 · Cited by 50
Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
Nakano, A., Kozawa, T., Tagawa, S., et al. (2006) · Japanese Journal of Applied Physics · doi:10.1143/jjap.45.l197 · Cited by 49
Self-citationKawai, Y., Otaka, A., Tanaka, A., et al. (1994) · Japanese Journal of Applied Physics · doi:10.1143/jjap.33.7023 · Cited by 49
Determination of acid dissociation constants of some phenol radical cations. Part 2
Holton, D. M., & Murphy, D. (1979) · Journal of the Chemical Society Faraday Transactions 2 Molecular and Chemical Physics · doi:10.1039/f29797501637 · Cited by 49
Proton and anion distribution and line edge roughness of chemically amplified electron beam resist
Kozawa, T., Yamamoto, H., Saeki, A., et al. (2005) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2131875 · Cited by 48
Self-citationSubpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives
Okamoto, K., Kozawa, T., Saeki, A., et al. (2006) · Radiation Physics and Chemistry · doi:10.1016/j.radphyschem.2006.06.001 · Cited by 48
Self-citationGreen, N. J. B., Pilling, M. J., Pimblott, S. M., et al. (1989) · The Journal of Physical Chemistry · doi:10.1021/j100361a014 · Cited by 48
Energy dissipation in a thin polymer film by electron beam scattering: Experiment
Hawryluk, R. J., Smith, H. I., Soares, A., et al. (1975) · Journal of Applied Physics · doi:10.1063/1.321929 · Cited by 48
Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region
Matsuzawa, N., Oizumi, H., Mori, S., et al. (1999) · Japanese Journal of Applied Physics · doi:10.1143/jjap.38.7109 · Cited by 48
Kozawa, T., Tagawa, S., & Shell, M. K. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.l1143 · Cited by 47
Self-citationvan Beelen, E. S. E., Koblenz, T. A., Ingemann, S., et al. (2004) · The Journal of Physical Chemistry A · doi:10.1021/jp0375721 · Cited by 46
Kozawa, T., Saeki, A., & Tagawa, S. (2008) · Applied Physics Express · doi:10.1143/apex.1.027001 · Cited by 46
Self-citationIto, O., Akiho, S., & Iino, M. (1989) · The Journal of Organic Chemistry · doi:10.1021/jo00271a038 · Cited by 46
Geuskens, G., & David, C. (1973) · Die Makromolekulare Chemie · doi:10.1002/macp.1973.021650124 · Cited by 45
Reduction of line edge roughness in the top surface imaging process
Mori, S., Morisawa, T., Matsuzawa, N., et al. (1998) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.590409 · Cited by 45
Saeki, A., Kozawa, T., Ohnishi, Y., et al. (2007) · The Journal of Physical Chemistry A · doi:10.1021/jp067520m · Cited by 44
Self-citationYamamoto, H., Kozawa, T., Nakano, A., Okamoto, K., Tagawa, S., Ando, T., Satô, M., & Komano, H. (2004) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1813452 · Cited by 44
Self-citationAnisole radical cation reactions in aqueous solution
Holcman, J., & Sehested, K. (1976) · The Journal of Physical Chemistry · doi:10.1021/j100555a027 · Cited by 43
Shoute, L. C. T., & Neta, P. (1990) · The Journal of Physical Chemistry · doi:10.1021/j100369a046 · Cited by 43
Ronlán, A., Coleman, J., Hammerich, O., et al. (1974) · Journal of the American Chemical Society · doi:10.1021/ja00810a033 · Cited by 43
Progress in EUV Resist Development
Shimizu, D., Maruyama, K., Saitou, A., et al. (2007) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.20.423 · Cited by 42
Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists
Asakawa, K., Ushirogouchi, T., & Nakase, M. (1995) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.210361 · Cited by 42
Recent status and future direction of EUV resist technology
Itani, T. (2008) · Microelectronic Engineering · doi:10.1016/j.mee.2008.11.023 · Cited by 41
Kozawa, T., Okamoto, K., Nakamura, J., et al. (2008) · Applied Physics Express · doi:10.1143/apex.1.067012 · Cited by 41
Self-citationA MALDI, TGA, TG/MS, and DEA study of the irradiation effects on PMMA
Tatro, S. R., Baker, G. R., Bisht, K. S., & Harmon, J. P. (2002) · Polymer · doi:10.1016/s0032-3861(02)00727-9 · Cited by 39
Generation of a subpicosecond relativistic electron single bunch at theS-band linear accelerator
Uesaka, M., Tauchi, K., Kozawa, T., Kobayashi, T., Ueda, T., & Miya, K. (1994) · Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics · doi:10.1103/physreve.50.3068 · Cited by 37
Self-citationLine edge roughness of a latent image in post-optical lithography
Saeki, A., Kozawa, T., Tagawa, S., et al. (2006) · Nanotechnology · doi:10.1088/0957-4484/17/6/001 · Cited by 37
Self-citationBartczak, W. M., & Hummel, A. (1993) · The Journal of Physical Chemistry · doi:10.1021/j100109a001 · Cited by 37
Shiraishi, H., Yoshimura, T., Sakamizu, T., et al. (1994) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.587570 · Cited by 37
Hacker, N. P., & Welsh, K. M. (1991) · Macromolecules · doi:10.1021/ma00008a075 · Cited by 36
Lithography Based on Molecular Glasses
Tsuchiya, K., Chang, S. W., Felix, N. M., Ueda, M., & Ober, C. K. (2005) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.18.431 · Cited by 35
Jay‐Gerin, J., Goulet, T., & Billard, I. (1993) · Canadian Journal of Chemistry · doi:10.1139/v93-042 · Cited by 35
Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)
Nakano, A., Okamoto, K., Kozawa, T., et al. (2004) · Japanese Journal of Applied Physics · doi:10.1143/jjap.43.4363 · Cited by 34
Self-citationKozawa, T., Tagawa, S., Santillan, J. J., et al. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.4926 · Cited by 34
Self-citationComparison of acid-generating efficiencies in 248 and 193-nm photoresists
Cameron, J. F., Chan, N., Moore, K., et al. (2001) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.436838 · Cited by 34
Vogt, B. D., Kang, S., Prabhu, V. M., Rao, A. K., Lin, E. K., Wu, W.-L., Satija, S. K., & Turnquest, K. L. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2429675 · Cited by 34
Ushirogouchi, T., Asakawa, K., Nakase, M., et al. (1995) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.210384 · Cited by 33
Development of laser-synchronized picosecond pulse radiolysis system
Yoshida, Y., Mizutani, Y., Kozawa, T., et al. (2001) · Radiation Physics and Chemistry · doi:10.1016/s0969-806x(00)00368-6 · Cited by 32
Self-citationKozawa, T., & Tagawa, S. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.7822 · Cited by 32
Self-citationNatsuda, K., Kozawa, T., Okamoto, K., et al. (2009) · Japanese Journal of Applied Physics · doi:10.1143/jjap.48.06fc05 · Cited by 32
Self-citationNucleophilic effects on the deprotonation of phenol radical cations
Ganapathi, M. R., Naumov, S., Hermann, R., et al. (2001) · Chemical Physics Letters · doi:10.1016/s0009-2614(01)00216-0 · Cited by 31
Film Quantum Yields of Ultrahigh PAG EUV Photoresists
Brainard, R. L., Higgins, C., Hassanein, E., et al. (2008) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.21.457 · Cited by 31
Evidence for two electron states in solvation and scavenging processes in alcohols
Lewis, M. A., & Jonah, C. D. (1986) · The Journal of Physical Chemistry · doi:10.1021/j100412a095 · Cited by 30
Formation of Intramolecular Poly(4-hydroxystyrene) Dimer Radical Cation
Okamoto, K., Kozawa, T., Natsuda, K., et al. (2008) · The Journal of Physical Chemistry B · doi:10.1021/jp801949s · Cited by 30
Self-citationEffects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices
Nakano, A., Okamoto, K., Kozawa, T., et al. (2004) · Japanese Journal of Applied Physics · doi:10.1143/jjap.43.3981 · Cited by 29
Self-citationThermal and Photo-Induced Reactions of Polymer Radicals in γ-Irradiated Poly(alkyl methacrylate)
Tanaka, M., Yoshida, H., & Ichikawa, T. (1990) · Polymer Journal · doi:10.1295/polymj.22.835 · Cited by 29
Kozawa, T., & Tagawa, S. (2009) · Applied Physics Express · doi:10.1143/apex.2.056503 · Cited by 29
Self-citationKesper, K., Diehl, F., Simon, J. G. G., et al. (1991) · Chemical Physics · doi:10.1016/0301-0104(91)80064-o · Cited by 28
Ogasawara, M., Tanaka, M., & Yoshida, H. (1987) · The Journal of Physical Chemistry · doi:10.1021/j100288a034 · Cited by 28
Study on acid generation from polymer
Yamamoto, H., Kozawa, T., Nakano, A., et al. (2005) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2121730 · Cited by 28
Self-citationPhotoresist film thickness for extreme ultraviolet lithography
Dentinger, P. M., Cardinale, G. F., Henderson, C. C., et al. (2000) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.390098 · Cited by 28
Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication
Kozawa, T., Tagawa, S., Santillan, J. J., et al. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.4465 · Cited by 28
Self-citationIonic species in irradiated poly(methyl methacrylate). A pulse radiolysis and ESR study
Tabata, M., Nilsson, G., Lund, A., et al. (1983) · Journal of Polymer Science Polymer Chemistry Edition · doi:10.1002/pol.1983.170211122 · Cited by 28
Simple method for measuring acid generation quantum efficiency at 193 nm
Szmanda, C. R., Kavanagh, R. J., Bohland, J. F., et al. (1999) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.350274 · Cited by 27
Kozawa, T., Okamoto, K., Saeki, A., et al. (2009) · Japanese Journal of Applied Physics · doi:10.1143/jjap.48.056508 · Cited by 27
Self-citationComputer Simulation of the Ion Escape from High-Energy Electron Tracks in Nonpolar Liquids
Siebbeles, L. D. A., Bartczak, W. M., Terrissol, M., et al. (1997) · The Journal of Physical Chemistry A · doi:10.1021/jp962166l · Cited by 27
Performance of molecular resist based on polyphenol in EUV lithography
Oizumi, H., Kumasaka, F., Tanaka, Y., Hirayama, T., Shiono, D., Hada, H., Onodera, J., Yamaguchi, A., & Nishiyama, I. (2006) · Microelectronic Engineering · doi:10.1016/j.mee.2006.01.025 · Cited by 27
HUNT, J. W., & Chase, W. J. (1977) · Canadian Journal of Chemistry · doi:10.1139/v77-289 · Cited by 26
Evaluation of New Molecular Resist for EUV Lithography
Oizumi, H., Tanaka, Y., Kumise, T., et al. (2007) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.20.403 · Cited by 25
Synchronization of femtosecond UV-IR laser with electron beam for pulse radiolysis studies
Saeki, A., Kozawa, T., Kashiwagi, S., et al. (2005) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/j.nima.2005.03.123 · Cited by 25
Self-citationA description of random walks with collision anisotropy and with a nonconstant mean free path
Goulet, T., Mattél, I., & Jay‐Gerin, J. (1990) · Canadian Journal of Physics · doi:10.1139/p90-128 · Cited by 25
Reaction mechanism of fluorinated chemically amplified resists
Yamamoto, H., Kozawa, T., Okamoto, K., et al. (2006) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2214711 · Cited by 25
Self-citationHigh-Absorption Resist Process for Extreme Ultraviolet Lithography
Kozawa, T., & Tagawa, S. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.8354 · Cited by 25
Self-citationRyan, J. M., Hoole, A. C. F., & Broers, A. N. (1995) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.588317 · Cited by 24
Studies on Reaction Mechanisms of EB Resist by Pulse Radiolysis.
Tsuji, S., Kozawa, T., Yamamoto, Y., et al. (2000) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.13.733 · Cited by 24
Self-citationRassolov, V. A., & Mozumder, A. (2001) · The Journal of Physical Chemistry B · doi:10.1021/jp0032661 · Cited by 24
Hirose, R., Kozawa, T., Tagawa, S., Shimizu, D., Kai, T., & Shimokawa, T. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.7125 · Cited by 23
Self-citationKozawa, T., & Tagawa, S. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.8328 · Cited by 23
Self-citationVery high voltage (500 kV) electron beam lithography for thick resists and high resolution
Jones, G. A. C., Blythe, S., & Ahmed, H. (1987) · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · doi:10.1116/1.583844 · Cited by 22
A Standard Addition Technique To Quantify Photoacid Generation in Chemically Amplified Photoresist
Pawloski, A. R., Christian, & Nealey, P. F. (2001) · Chemistry of Materials · doi:10.1021/cm010529a · Cited by 22
Main chain scission reaction of poly(methyl methacrylate) caused by two‐photon ionization of dopant
Sakai, W., Tsuchida, A., Yamamoto, M., et al. (1995) · Journal of Polymer Science Part A Polymer Chemistry · doi:10.1002/pola.1995.080331203 · Cited by 22
Kozawa, T., & Tagawa, S. (2008) · Applied Physics Express · doi:10.1143/apex.1.107001 · Cited by 22
Self-citationPhotochemical and photophysical studies on chemically amplified resists.
Hacker, N. P., Hofer, D. C., & Welsh, K. M. (1992) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.5.35 · Cited by 22
Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons
Natsuda, K., Kozawa, T., Saeki, A., et al. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.4932 · Cited by 21
Self-citationToriumi, M., Santillan, J. J., Itani, T., et al. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2787850 · Cited by 21
Effect of polymer molecular weight on AFM polymer aggregate size and LER of EUV resists
Cutler, C. A., Mackevich, J. F., Li, J., et al. (2003) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.482370 · Cited by 21
A Resist Material Study for LWR and Resolution Improvement in EUV Lithography
Yamashita, K., Kamimura, S., Takahashi, H., et al. (2008) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.21.439 · Cited by 21
Kozawa, T., Tagawa, S., & Shell, M. K. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.6288 · Cited by 20
Self-citationKozawa, T., Okamoto, K., Saeki, A., et al. (2005) · Japanese Journal of Applied Physics · doi:10.1143/jjap.44.3908 · Cited by 20
Self-citationSaeki, A., Kozawa, T., & Tagawa, S. (2005) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/j.nima.2005.10.068 · Cited by 20
Self-citationEffect of Coulomb interaction and pKa on acid diffusion in chemically amplified resists
Shi, X. (1999) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.590562 · Cited by 20
Nagahara, S., Sakurai, Y., Wakita, M., et al. (2000) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.388322 · Cited by 20
Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists
Kozawa, T., Tagawa, S., Santillan, J. J., et al. (2008) · Japanese Journal of Applied Physics · doi:10.1143/jjap.47.5404 · Cited by 19
Self-citationMeasurements of acid generation by extreme ultraviolet irradiation in lithographic films
Glodde, M., Goldfarb, D. L., Medeiros, D. R., Wallraff, G. M., & Denbeaux, G. P. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2779045 · Cited by 19
Reaction Mechanisms of Brominated Chemically Amplified Resists
Yamamoto, H., Kozawa, T., Nakano, A., et al. (2005) · Japanese Journal of Applied Physics · doi:10.1143/jjap.44.l842 · Cited by 18
Self-citationSaeki, A., Kozawa, T., Tagawa, S., et al. (2006) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2393250 · Cited by 18
Self-citationFree-Ion Yield and Electron Mobility in Liquid Hydrocarbons: A Consistent Correlation
Mozumder, A. (2002) · The Journal of Physical Chemistry A · doi:10.1021/jp021268a · Cited by 17
Shigaki, T., Okamoto, K., Kozawa, T., et al. (2006) · Japanese Journal of Applied Physics · doi:10.1143/jjap.45.5735 · Cited by 17
Self-citationMasuda, S., Kawanishi, Y., Hirano, S., et al. (2006) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.656238 · Cited by 17
Nagahara, S., Yuan, L., Poppe, W. J., et al. (2005) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.598949 · Cited by 17
Sullivan, P. D., & Brette, N. A. (1975) · The Journal of Physical Chemistry · doi:10.1021/j100572a015 · Cited by 17
Cidnp study on porphyrin-photosensitized reactions with phenol and quinone
Maruyama, K., Furuta, H., & Osuka, A. (1986) · Tetrahedron · doi:10.1016/s0040-4020(01)88075-3 · Cited by 16
Theoretical Study of W Values in Hydrocarbon Gases
Kimura, M., Kowari, K.-I., Inokuti, M., et al. (1991) · Radiation Research · doi:10.2307/3578104 · Cited by 16
Furukawa, K., Kozawa, T., Seki, S., et al. (2008) · Applied Physics Express · doi:10.1143/apex.1.067001 · Cited by 15
Self-citationEffect of Acid Diffusion and Polymer Structure on Line Edge Roughness
Yamamoto, H., Kozawa, T., Saeki, A., Okamoto, K., Tagawa, S., Ohmori, K., Satô, M., & Komano, H. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.6187 · Cited by 15
Self-citationNakano, A., Okamoto, K., Yamamoto, Y., et al. (2005) · Japanese Journal of Applied Physics · doi:10.1143/jjap.44.5832 · Cited by 15
Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer
Yamamoto, H., Kozawa, T., Tagawa, S., et al. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.l648 · Cited by 14
Self-citationMulti spur effect on decay kinetics of geminate ion recombination using Monte Carlo technique
Saeki, A., Kozawa, T., Yoshida, Y., et al. (2005) · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · doi:10.1016/j.nimb.2005.02.002 · Cited by 14
Self-citationPulse radiolysis study of polymerization of vinylcarbazole in benzonitrile solutions
Tagawa, S., Arai, S., Kira, A., et al. (1972) · Journal of Polymer Science Part B Polymer Letters · doi:10.1002/pol.1972.110100411 · Cited by 14
Self-citationSensitivity Characteristics of Positive and Negative Resists at 200 kV Electron-Beam Lithography
Kim, B., Lee, H., Wi, J., et al. (2004) · Japanese Journal of Applied Physics · doi:10.1143/jjap.44.l95 · Cited by 14
Photon W-value for Ar in the sub-keV X-ray region
Saitô, N., & Suzuki, I. (2001) · Radiation Physics and Chemistry · doi:10.1016/s0969-806x(00)00364-9 · Cited by 14
Computer simulation of electron scavenging in multipair spurs in dielectric liquids
Wojcik, M., Bartczak, W. M., & Hummel, A. (1992) · The Journal of Chemical Physics · doi:10.1063/1.463937 · Cited by 14
Investigating Line-Edge Roughness in Calixarene Fine Patterns Using Fourier Analysis
Ishida, M., Kobayashi, K., Fujita, J., et al. (2002) · Japanese Journal of Applied Physics · doi:10.1143/jjap.41.4228 · Cited by 14
Effect of Inner-shell Excitations on the W-Value of Propane
Suzuki, I., & Saitô, N. (1985) · Bulletin of the Chemical Society of Japan · doi:10.1246/bcsj.58.3210 · Cited by 14
Selective anodic oxidation of p-alkylaryl ethers—pathways and products
Buck, R. P., & Wagoner, D. E. (1980) · Journal of Electroanalytical Chemistry · doi:10.1016/s0022-0728(80)80498-0 · Cited by 13
Matsui, Y., Sugawara, H., Seki, S., et al. (2008) · Applied Physics Express · doi:10.1143/apex.1.036001 · Cited by 12
Flagged first, then by citations
Research works printed but not linked: 6
- 1989, Polym. Mater. Sci. Eng., 61, 269
- 1987, Int. J. Radiat. Appl. Instrum., Part C, 30, 83
- 1990, Int. J. Radiat. Appl. Instrum., Part C, 36, 195
- 1989, Int. J. Radiat. Appl. Instrum., Part C, 34, 145
- 1989, Int. J. Radiat. Appl. Instrum., Part C, 34, 553
- 1963, J. Polym. Sci., Part A, 1, 1079
Cited by
Sorted by citations
Beyond EUV lithography: a comparative study of efficient photoresists' performance
Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015) · Scientific Reports · doi:10.1038/srep09235 · Cited by 162
Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, A. M., & Ekinci, Y. (2018) · Journal of Micro/Nanopatterning Materials and Metrology · doi:10.1117/1.jmm.17.2.023505 · Cited by 105
Advanced lithography materials: From fundamentals to applications
Zhang, Y., Yu, H., Wang, L., Wu, X., He, J., Huang, W., Ouyang, C., Chen, D., & Keshta, B. E. (2024) · Advances in Colloid and Interface Science · doi:10.1016/j.cis.2024.103197 · Cited by 72
Improvements in resist performance towards EUV HVM
Yildirim, O., Buitrago, E., Hoefnagels, R., Meeuwissen, M., Wuister, S., Rispens, G., van Oosten, A., Derks, P., Finders, J., Vockenhuber, M., et al. (2017) · SPIE Proceedings · doi:10.1117/12.2257415 · Cited by 69
Resistless EUV lithography: Photon-induced oxide patterning on silicon
Tseng, L.-T., Karadan, P., Kazazis, D., Constantinou, P. C., Stock, T. J. Z., Curson, N. J., Schofield, S. R., Muntwiler, M., Aeppli, G., & Ekinci, Y. (2023) · Science Advances · doi:10.1126/sciadv.adf5997 · Cited by 34
Extreme ultraviolet photoemission of a tin-based photoresist
Zhang, Y., Haitjema, J., Castellanos, S., Lugier, O., Sadegh, N., Ovsyannikov, R., Giangrisostomi, E., Johansson, F. O. L., Berggren, E., Lindblad, A., et al. (2021) · Applied Physics Letters · doi:10.1063/5.0047269 · Cited by 35
Molecular excitation and relaxation of extreme ultraviolet lithography photoresists
Ogletree, D. F. (2016) · Frontiers of Nanoscience · doi:10.1016/b978-0-08-100354-1.00002-8 · Cited by 32
Key Challenges and Opportunities for Advanced Extreme Ultraviolet Lithography Photoresist Materials
Li, M., & Aqad, E. (2025) · Advanced Functional Materials · doi:10.1002/adfm.202420962 · Cited by 33
Naqvi, B. A., Enomoto, S., Machida, K., Takata, Y., Kozawa, T., Muroya, Y., De Gendt, S., & De Simone, D. (2024) · Chemistry of Materials · doi:10.1021/acs.chemmater.3c02628 · Cited by 29
Self-citationBiradar, M. R., Sagdic, G., Yuan, C., Marui, R., & Ober, C. K. (2026) · Chemical Reviews · doi:10.1021/acs.chemrev.5c01043 · Cited by 6
Advanced Photoresists: Development, Application and Market
Tang, Y. (2023) · Highlights in Science Engineering and Technology · doi:10.54097/hset.v29i.4215 · Cited by 6
Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography †
Li, H., Peng, R., Liu, Z., Lian, P., Chen, J., Yu, T., Zeng, Y., Wang, S., Guo, X., Hu, R., et al. (2026) · Chinese Journal of Chemistry · doi:10.1002/cjoc.70573 · Cited by 2
Metadata
- Authors
- Kozawa, T., & Tagawa, S.
- Affiliations
- The Institute of Scientific and Industrial Research, The University of Osaka (JP)
- Venue
- Japanese Journal of Applied Physics
- Publisher
- IOP Publishing
- Published
- 2010-03-01
- Volume
- 49
- Issue
- 3R
- Pages
- 030001
- ISSN
- 0021-4922 (ISSN-L)
- 1347-4065
- OpenAlex
- W2027253590
- Cited by
- 360
- References
- 221
- Citations by year
- 2026: 23 · 2025: 31 · 2024: 38 · 2023: 22 · 2022: 21 · 2021: 17 · 2020: 12 · 2019: 18 · 2018: 16 · 2017: 16 · 2016: 31 · 2015: 24 · 2014: 27 · 2013: 21 · 2012: 14
- FWCI
- 16.14
- Type
- journal article
- Language
- en
- Open access
- bronze
- doi.org
- Licence
- Locations
- Japanese Journal of Applied Physics (publishedVersion)
- Funders
- Japan Society for the Promotion of Science (21656238)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Chemistry › Organic Chemistry › Photopolymerization techniques and applications
- Physical Sciences › Materials Science › Polymers and Plastics › Synthesis and properties of polymers
- Keywords
- radiation chemistry, chemically amplified resists, EUV lithography, proton migration, energy deposition, ionizing radiation, KrF lithography, ArF immersion lithography, semiconductor manufacturing
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
