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Organic solvent-free water-developable sugar resist material derived from biomass in green lithography
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Advanced computational lithography is necessary for proper design of masks for high-NA systems, as is the case for lower-NA ones.
“Advanced computational lithography is necessary for proper design of masks for high-NA systems, as is the case for lower-NA ones 114 .”
From Extreme ultraviolet lithography (2024) · cites this paper as [114]
For HVM, further research and development will be necessary for improved light sources with higher power, optimized masks and mask materials, higher-resolution photoresists below 10 nm HP, more powerful computational lithography, and better control of stochastic processes.
“For HVM, further research and development will be necessary for improved light sources with h igher power, optimized masks and mask materials, higher -resolution photoresists below 10 nm HP, more powerful computational lithography 114 , and a better control of stochastic processes.”
From Extreme ultraviolet lithography (2024) · cites this paper as [114]
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Metadata
- Authors
- Takei, S., Oshima, A., Ichikawa, T., Sekiguchi, A., Kashiwakura, M., Kozawa, T., Tagawa, S., Oyama, T. G., Ito, S., & Miyasaka, H.
- Affiliations
- Toyama Prefectural University (JP)
- The Institute of Scientific and Industrial Research, The University of Osaka (JP)
- The University of Osaka (JP)
- Corresponding author
- Takei, Satoshi
- Venue
- Microelectronic Engineering
- Publisher
- Elsevier BV
- Published
- 2014-06
- Volume
- 122
- Pages
- 70-76
- ISSN
- 0167-9317 (ISSN-L)
- OpenAlex
- W2022945686
- Cited by
- 28
- References
- 40
- Citations by year
- 2024: 2 · 2023: 2 · 2022: 2 · 2020: 1 · 2019: 2 · 2018: 6 · 2017: 5 · 2016: 3 · 2015: 4 · 2014: 1
- FWCI
- 2.30
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Microelectronic Engineering (publishedVersion)
- Funders
- Asahi Glass Foundation
- Japan Society for the Promotion of Science (23681023, 26107002)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Nanofabrication and Lithography Techniques
- Physical Sciences › Materials Science › Materials Chemistry › Block Copolymer Self-Assembly
- Keywords
- biomass-derived materials, electron beam lithography, thermal stability, tacticity
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