Kim, Jiyoung

Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure

Azcatl, A., Qin, X., Prakash, A., Zhang, C., Cheng, L., Wang, Q., Lu, N., Kim, M. J., Kim, J., Cho, K., et al. (2016) · Nano Letters

2D Materials and ApplicationsGraphene research and applications

Cited by 491

Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

Tiwale, N., Subramanian, A., Kisslinger, K., Lu, M., Kim, J., Stein, A., & Nam, C.-Y. (2019) · Journal of Materials Chemistry C

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 78

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Le, D. N., Hwang, S. M., Woo, J., Choi, S., Park, T., Veyan, J.-F., Tiwale, N. M., Subramanian, A., Lee, W.-I., Nam, C.-Y., et al. (2022) · International Conference on Extreme Ultraviolet Lithography 2022

Advancements in Photolithography TechniquesSemiconductor materials and devices

Cited by 11