Suh, Hyo Seon

Topcoat approaches for directed self-assembly of strongly segregating block copolymer thin films

Yoshida, H., Suh, H. S., Ramirez-Herunandez, A., Lee, J. I., Aida, K., Wan, L., Ishida, Y., Tada, Y., Ruiz, R., de Pablo, J., et al. (2013) · Journal of Photopolymer Science and Technology

Block Copolymer Self-AssemblyAdvanced Polymer Synthesis and Characterization

Cited by 60

Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers

Fallica, R., Chen, S., De Simone, D., & Suh, H. S. (2022) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 25

Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis

Fallica, R., Huang, W., Suh, H. S., De Simone, D., Guerrero, D. J., & Kato, K. (2023) · International Conference on Extreme Ultraviolet Lithography 2023

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 1