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Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films
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PS-b-PDMS, PS-b-P2VP, and PS-b-PLA are capable of self-assembling into sub-10 nm domain sizes.
“Some other BCPs that are capable of self-assembling into sub-10 nm domain sizes include PS-b-PDMS [125], PS-b-P2VP [126], and PS-b-PLA [118].”
From Block Copolymers: Synthesis, Self-Assembly, and Applications (2017) · cites this paper as [126]
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Metadata
- Authors
- Yoshida, H., Suh, H. S., Ramirez-Herunandez, A., Lee, J. I., Aida, K., Wan, L., Ishida, Y., Tada, Y., Ruiz, R., de Pablo, J., & Nealey, P. F.
- Affiliations
- Hitachi (Japan) (JP)
- University of Chicago (US)
- University of Wisconsin–Madison (US)
- Western Digital (United States) (US)
- Venue
- Journal of Photopolymer Science and Technology
- Published
- 2013
- Volume
- 26
- Issue
- 1
- Pages
- 55-58
- ISSN
- 0914-9244 (ISSN-L)
- 1349-6336
- OpenAlex
- W1992886564
- Cited by
- 60
- References
- 12
- Citations by year
- 2026: 1 · 2025: 1 · 2024: 1 · 2023: 2 · 2022: 3 · 2021: 3 · 2020: 3 · 2019: 5 · 2018: 3 · 2017: 5 · 2016: 13 · 2015: 13 · 2014: 6 · 2013: 1
- FWCI
- 4.97
- Type
- journal article
- Language
- en
- Open access
- diamond
- doi.org
- Locations
- Journal of Photopolymer Science and Technology (publishedVersion)
- Topics
- Physical Sciences › Materials Science › Materials Chemistry › Block Copolymer Self-Assembly
- Physical Sciences › Chemistry › Organic Chemistry › Advanced Polymer Synthesis and Characterization
- Physical Sciences › Engineering › Computational Mechanics › Fluid Dynamics and Thin Films
- Keywords
- top coat, directed self-assembly, block copolymers, thin films, segregation, photolithography, polymer patterning
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