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Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability
Abstract
The promising energy storage properties of new lead-free antiferroelectric HfxZr1-xO2 (x = 0.1–0.4) films with high energy storage density are reported. The energy storage density of the Hf0.3Zr0.7O2 capacitor does not decrease with the increase in temperature up to 175 °C, and it decreases by only ≈4.5% after field cycling 109 times.
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Cited by
Electroceramics for High-Energy Density Capacitors: Current Status and Future Perspectives
Wang, G., Lu, Z., Li, Y., Li, L., Ji, H., Feteira, A., Zhou, D., Wang, D., Zhang, S., & Reaney, I. M. (2021) · Chemical Reviews · doi:10.1021/acs.chemrev.0c01264 · Cited by 1,380
Physical Mechanisms behind the Field‐Cycling Behavior of HfO2‐Based Ferroelectric Capacitors
Pešić, M., Fengler, F. P. G., Larcher, L., Padovani, A., Schenk, T., Grimley, E. D., Sang, X., LeBeau, J. M., Slesazeck, S., Schroeder, U., et al. (2016) · Advanced Functional Materials · doi:10.1002/adfm.201600590 · Cited by 964
Evidence for oxygen vacancies movement during wake-up in ferroelectric hafnium oxide
Starschich, S., Menzel, S., & Böttger, U. (2016) · Applied Physics Letters · doi:10.1063/1.4940370 · Cited by 308
Zhou, Y., Zhang, Y. K., Yang, Q., Jiang, J., Fan, P., Liao, M., & Zhou, Y. C. (2019) · Computational Materials Science · doi:10.1016/j.commatsci.2019.05.041 · Cited by 268
Doped Hf0.5Zr0.5O2 for high efficiency integrated supercapacitors
Lomenzo, P. D., Chung, C.-C., Zhou, C., Jones, J. L., & Nishida, T. (2017) · Applied Physics Letters · doi:10.1063/1.4985297 · Cited by 117
Metadata
- Authors
- Park, M. H., Kim, H. J., Kim, Y. J., Moon, T., Kim, K. D., & Hwang, C. S.
- Venue
- Advanced Energy Materials
- Publisher
- Wiley
- Published
- 2014-07
- Volume
- 4
- Issue
- 16
- ISSN
- 1614-6832 (ISSN-L)
- 1614-6840
- OpenAlex
- W2119033937
- Cited by
- 344
- References
- 0
- FWCI
- 8.93
- Type
- journal article
- Language
- en
- Open access
- closed
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- CoChat. (2026). Citation check: Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability. https://app.cochat.ai/papers/10.1002/aenm.201400610
- The paper
- Park, M. H., Kim, H. J., Kim, Y. J., Moon, T., Kim, K. D., & Hwang, C. S. (2014). Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability. Advanced Energy Materials. https://doi.org/10.1002/aenm.201400610
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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