The DOI matches its Crossref record; 4 of the 4 references it cites were found in a registry or an index.
Anisotropic etching of silicon in TMAH solutions
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Citations
Cites
Seidel, H., Csepregi, L., Heuberger, A., & Baumgärtel, H. (1990) · Journal of The Electrochemical Society · doi:10.1149/1.2086277 · Cited by 1,633
On etching very narrow grooves in silicon
Kendall, D. L. (1975) · Applied Physics Letters · doi:10.1063/1.88113 · Cited by 131
Tactile image detection using a 1k-element silicon pressure sensor array
Sugiyama, S., Kawahata, K., Yoneda, M., & Igarashi, I. (1990) · Sensors and Actuators A Physical · doi:10.1016/0924-4247(89)80001-9 · Cited by 66
Self-citationCesium hydroxide (CsOH): a useful etchant for micromachining silicon
Clark, L. D., Lund, J. L., & Edell, D. J. (2003) · Solid-State Sensors, Actuators, and Microsystems Workshop (Hilton Head Workshop) · doi:10.1109/solsen.1988.26419 · Cited by 36
Cited by
Label-free immunodetection with CMOS-compatible semiconducting nanowires
Stern, E., Klemic, J. F., Routenberg, D. A., Wyrembak, P. N., Turner-Evans, D. B., Hamilton, A. D., LaVan, D. A., Fahmy, T. M., & Reed, M. A. (2007) · Nature · doi:10.1038/nature05498 · Cited by 1,352
Bulk micromachining of silicon
Kovacs, G. T. A., Maluf, N. I., & Petersen, K. E. (1998) · Proceedings of the IEEE · doi:10.1109/5.704259 · Cited by 733
A dielectric-modulated field-effect transistor for biosensing
Im, H., Huang, X.-J., Gu, B., & Choi, Y.-K. (2007) · Nature Nanotechnology · doi:10.1038/nnano.2007.180 · Cited by 635
Abgrall, P., & Gué, A.-M. (2007) · Journal of Micromechanics and Microengineering · doi:10.1088/0960-1317/17/5/r01 · Cited by 561
Nernst Limit in Dual-Gated Si-Nanowire FET Sensors
Knopfmacher, O., Tarasov, A., Fu, W., Wipf, M., Niesen, B., Calame, M., & Schönenberger, C. (2010) · Nano Letters · doi:10.1021/nl100892y · Cited by 353
Metadata
- Authors
- Tabata, O., Asahi, R., Funabashi, H., Shimaoka, K., & Sugiyama, S.
- Venue
- Sensors and Actuators A: Physical
- Publisher
- Elsevier BV
- Published
- 1992-07
- Volume
- 34
- Issue
- 1
- Pages
- 51-57
- ISSN
- 0924-4247 (ISSN-L)
- OpenAlex
- W2092346700
- Cited by
- 466
- References
- 4
- FWCI
- 2.80
- Type
- journal article
- Language
- en
- Open access
- closed
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Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
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How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Anisotropic etching of silicon in TMAH solutions. https://app.cochat.ai/papers/10.1016/0924-4247(92)80139-t
- The paper
- Tabata, O., Asahi, R., Funabashi, H., Shimaoka, K., & Sugiyama, S. (1992). Anisotropic etching of silicon in TMAH solutions. Sensors and Actuators A: Physical. https://doi.org/10.1016/0924-4247(92)80139-t
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
