Cited by 311Metal and Thin Film MechanicsAdvanced machining processes and optimizationSurface Treatment and Coatings

Physical Vapor Deposition Technology for Coated Cutting Tools: A Review

Deng, Yang, Chen, Wanglin, Li, Bingxin, Wang, Chengyong, Kuang, Tongchun, Li, Yanqiu·2020·Ceramics International

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Crossref · 10.1016/j.ceramint.2020.04.168

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173 of 173 references verified0 citation errors · 0 not checkable

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  • PVD generates dense and well-adhered films, allows coating of a wide range of substrates, and in many cases offers cost advantages over alternative routes.

    “Although some PVD methods allow the film growth even at room temperature, PVD generates dense and well-adhered films, allowing the coating of a wide range of substrates and, in many cases, offering cost advantages over alternative routes.”

    From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [141]

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Authors
Deng, Y., Chen, W., Li, B., Wang, C., Kuang, T., & Li, Y.
Affiliations
  • Guangdong University of Technology (CN)
  • South China University of Technology (CN)
Corresponding author
Wang, Chengyong
Venue
Ceramics International
Publisher
Elsevier BV
Published
2020-08
Volume
46
Issue
11
Pages
18373-18390
ISSN
0272-8842 (ISSN-L)
OpenAlex
W3018825940
Cited by
311
References
173
Citations by year
2026: 41 · 2025: 76 · 2024: 61 · 2023: 59 · 2022: 46 · 2021: 24 · 2020: 4
FWCI
16.98
Type
journal article
Language
en
Open access
closed
Locations
Ceramics International (publishedVersion)
Funders
  • Key Basic and Applied Research Program of Guangdong Province, China (2019B030302010)
  • National Natural Science Foundation of China (51735003, 51471071)
Topics
  • Physical Sciences › Engineering › Mechanics of Materials › Metal and Thin Film Mechanics
  • Physical Sciences › Engineering › Mechanical Engineering › Advanced machining processes and optimization
  • Physical Sciences › Engineering › Mechanical Engineering › Surface Treatment and Coatings
Keywords
physical vapor deposition, coated cutting tools, hard coatings, cathodic arc deposition, magnetron sputtering, plasma etching, coating adhesion strength, coating deposition rate, difficult-to-cut materials

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