Cited by 43Optical measurement and interference techniquesAdvanced Measurement and Metrology TechniquesLaser-Matter Interactions and Applications

Measurement of thickness profile and refractive index variation of a silicon wafer using the optical comb of a femtosecond pulse laser

Park, Jungjae, Jin, Jonghan, Wan Kim, Jae, Kim, Jong-Ahn·2013·Optics Communications

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Crossref · 10.1016/j.optcom.2013.03.055

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8 of 8 references verified0 citation errors · 0 not checkable

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Authors
Park, J., Jin, J., Wan Kim, J., & Kim, J.-A.
Affiliations
Korea Research Institute of Standards and Science (KR)
Corresponding author
Jin, Jonghan
Venue
Optics Communications
Publisher
Elsevier BV
Published
2013-09
Volume
305
Pages
170-174
ISSN
0030-4018 (ISSN-L)
OpenAlex
W2013955378
Cited by
43
References
8
Citations by year
2026: 2 · 2024: 2 · 2023: 1 · 2022: 2 · 2021: 5 · 2020: 4 · 2019: 7 · 2018: 4 · 2017: 3 · 2016: 5 · 2015: 5 · 2014: 2 · 2013: 1
FWCI
4.88
Type
journal article
Language
en
Open access
closed
Locations
Optics Communications (publishedVersion)
Funders
Korea Research Institute of Standards and Science (13011001)
Topics
  • Physical Sciences › Computer Science › Computer Vision and Pattern Recognition › Optical measurement and interference techniques
  • Physical Sciences › Engineering › Mechanical Engineering › Advanced Measurement and Metrology Techniques
  • Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Laser-Matter Interactions and Applications
Keywords
silicon wafers, refractive index change, spectral-domain interferometry, interferogram analysis, repeatability, measurement uncertainty

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