The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.
A novel pulsed magnetron sputter technique utilizing very high target power densities
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Citations
Cites
Lehnert, B. (1971) · Nuclear Fusion · doi:10.1088/0029-5515/11/5/010 · Cited by 239
Unbalanced dc magnetrons as sources of high ion fluxes
Window, B., & Savvides, N. (1986) · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · doi:10.1116/1.573904 · Cited by 212
Petrov, I., Myers, A., Greene, J. E., & Abelson, J. R. (1994) · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · doi:10.1116/1.578955 · Cited by 199
Self-citation
Research works printed but not linked: 2
- Posadowski, 1995, Vacuum, 46, 1017, 10.1016/0042-207X(95)00096-8 · doi:10.1016/0042-207x(95)00096-8
- Rossnagel, 1994, J. Vac. Sci. Technol. B, 12, 449, 10.1116/1.587142 · doi:10.1116/1.587142
Cited by
Ionized physical vapor deposition (IPVD): A review of technology and applications
Helmersson, U., Lattemann, M., Bohlmark, J., Ehiasarian, A. P., & Gudmundsson, J. T. (2006) · Thin Solid Films · doi:10.1016/j.tsf.2006.03.033 · Cited by 1,081
Self-citationPhysics and technology of magnetron sputtering discharges
Gudmundsson, J. T. (2020) · Plasma Sources Science and Technology · doi:10.1088/1361-6595/abb7bd · Cited by 532
Physical Vapor Deposition Technology for Coated Cutting Tools: A Review
Deng, Y., Chen, W., Li, B., Wang, C., Kuang, T., & Li, Y. (2020) · Ceramics International · doi:10.1016/j.ceramint.2020.04.168 · Cited by 311
Physics of E × B discharges relevant to plasma propulsion and similar technologies
Kaganovich, I. D., Smolyakov, A., Raitses, Y., Ahedo, E., Mikellides, I. G., Jorns, B., Taccogna, F., Gueroult, R., Tsikata, S., Bourdon, A., et al. (2020) · Physics of Plasmas · doi:10.1063/5.0010135 · Cited by 202
“81 Although simulations have shown that spokes can form in collisionless plasmas without ionization, 75 there is strong evidence from numerous experiments in high power pulsed magnetron discharges (High Power Impulse Magnetron Sputtering—HiPIMS discharges) and in lower power, DC magnetron discharges 99,100,103 that io…”
InfluentialReactive HiPIMS Deposition of SiO2/Ta2O5 Optical Interference Filters
Hála, M., Vernhes, R., Zabeida, O., Klemberg-Sapieha, J.-E., & Martinu, L. (2014) · Journal of Applied Physics · doi:10.1063/1.4903285 · Cited by 51
Metadata
- Authors
- Kouznetsov, V., Macák, K., Schneider, J. M., Helmersson, U., & Petrov, I.
- Venue
- Surface and Coatings Technology
- Publisher
- Elsevier BV
- Published
- 1999-12
- Volume
- 122
- Issue
- 2-3
- Pages
- 290-293
- ISSN
- 0257-8972 (ISSN-L)
- OpenAlex
- W2051944828
- Cited by
- 1,080
- References
- 3
- FWCI
- 2.37
- Type
- journal article
- Language
- en
- Open access
- closed
- Licence
- www.elsevier.com/tdm/userlicense/1.0/ (tdm)
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- CoChat. (2026). Citation check: A novel pulsed magnetron sputter technique utilizing very high target power densities. https://app.cochat.ai/papers/10.1016/s0257-8972(99)00292-3
- The paper
- Kouznetsov, V., Macák, K., Schneider, J. M., Helmersson, U., & Petrov, I. (1999). A novel pulsed magnetron sputter technique utilizing very high target power densities. Surface and Coatings Technology. https://doi.org/10.1016/s0257-8972(99)00292-3
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.