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Degenerate n-Doping of Few-Layer Transition Metal Dichalcogenides by Potassium

Fang, Hui, Tosun, Mahmut, Seol, Gyungseon, Chang, Ting Chia, Takei, Kuniharu, Guo, Jing, Javey, Ali·2013·Nano Letters

Abstract

We report here the first degenerate n-doping of few-layer MoS2 and WSe2 semiconductors by surface charge transfer using potassium. High-electron sheet densities of ~1.0 × 10(13) cm(-2) and 2.5 × 10(12) cm(-2) for MoS2 and WSe2 are obtained, respectively. In addition, top-gated WSe2 and MoS2 n-FETs with selective K doping at the metal source/drain contacts are fabricated and shown to exhibit low contact resistances. Uniquely, WSe2 n-FETs are reported for the first time, exhibiting an electron mobility of ~110 cm(2)/V·s, which is comparable to the hole mobility of previously reported p-FETs using the same material. Ab initio simulations were performed to understand K doping of MoS2 and WSe2 in comparison with graphene. The results here demonstrate the need of degenerate doping of few-layer chalcogenides to improve the contact resistances and further realize high performance and complementary channel electronics.

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Metadata

Authors
Fang, H., Tosun, M., Seol, G., Chang, T. C., Takei, K., Guo, J., & Javey, A.
Venue
Nano Letters
Published
2013-04-11
Volume
13
Issue
5
Pages
1991-1995
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W2045065560
Cited by
760
References
2
FWCI
33.15
Type
journal article
Language
en
Open access
closed

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