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Switching Mechanism in Single-Layer Molybdenum Disulfide Transistors: An Insight into Current Flow across Schottky Barriers

Open access
Liu, Han, Si, Mengwei, Deng, Yexin, Neal, Adam T., Du, Yuchen, Najmaei, Sina, Ajayan, Pulickel M., Lou, Jun, Ye, Peide D.·2014·ACS Nano

Abstract

In this article, we study the properties of metal contacts to single-layer molybdenum disulfide (MoS2) crystals, revealing the nature of switching mechanism in MoS2 transistors. On investigating transistor behavior as contact length changes, we find that the contact resistivity for metal/MoS2 junctions is defined by contact area instead of contact width. The minimum gate dependent transfer length is ∼0.63 μm in the on-state for metal (Ti) contacted single-layer MoS2. These results reveal that MoS2 transistors are Schottky barrier transistors, where the on/off states are switched by the tuning of the Schottky barriers at contacts. The effective barrier heights for source and drain barriers are primarily controlled by gate and drain biases, respectively. We discuss the drain induced barrier narrowing effect for short channel devices, which may reduce the influence of large contact resistance for MoS2 Schottky barrier transistors at the channel length scaling limit.

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Metadata

Authors
Liu, H., Si, M., Deng, Y., Neal, A. T., Du, Y., Najmaei, S., Ajayan, P. M., Lou, J., & Ye, P. D.
Venue
ACS Nano
Published
2013-12-23
Volume
8
Issue
1
Pages
1031-1038
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W1985295683
Cited by
254
References
0
FWCI
12.14
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Switching Mechanism in Single-Layer Molybdenum Disulfide Transistors: An Insight into Current Flow across Schottky Barriers. https://app.cochat.ai/papers/10.1021/nn405916t
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Liu, H., Si, M., Deng, Y., Neal, A. T., Du, Y., Najmaei, S., Ajayan, P. M., Lou, J., & Ye, P. D. (2014). Switching Mechanism in Single-Layer Molybdenum Disulfide Transistors: An Insight into Current Flow across Schottky Barriers. ACS Nano. https://doi.org/10.1021/nn405916t

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