The DOI matches its Crossref record.
Lithography gets extreme
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Nonlinear Optics with 2D Layered Materials
Autere, A., Jussila, H., Dai, Y., Wang, Y., Lipsanen, H. K., & Sun, Z. (2018) · Advanced Materials · doi:10.1002/adma.201705963 · Cited by 857
Directed self-assembly of block copolymers for use in bit patterned media fabrication
Griffiths, R. A., Williams, A. T., Oakland, C., et al. (2013) · Journal of Physics D Applied Physics · doi:10.1088/0022-3727/46/50/503001 · Cited by 375
Review on Micro- and Nanolithography Techniques and their Applications
Pimpin, A., & Srituravanich, W. (2012) · Engineering Journal · doi:10.4186/ej.2012.16.1.37 · Cited by 399
“In recent years, immersion lithography [8], resolution enhancement technology [9] and extreme-UV lithography [10] have been developed to improve the lithography”
BackgroundMethodShort-wavelength free-electron laser sources and science: a review *
Seddon, E. A., Clarke, J. A., Dunning, D. J., Masciovecchio, C., Milne, C. J., Parmigiani, F., Rugg, D. J., Spence, J. C. H., Thompson, N. R., Ueda, K., et al. (2017) · Reports on Progress in Physics · doi:10.1088/1361-6633/aa7cca · Cited by 258
Evolution in Lithography Techniques: Microlithography to Nanolithography
Sharma, E., Rathi, R., Misharwal, J., Sinhmar, B., Kumari, S., Dalal, J., & Kumar, A. (2022) · Nanomaterials · doi:10.3390/nano12162754 · Cited by 257
“The masks used in EUVL must be reflective and should not have a protective pellicle, as pellicle can result in absorption of the EUV beam [40].”
Background
Metadata
- Authors
- Wagner, C., & Harned, N.
- Affiliations
- ASML (Netherlands) (NL)
- Corresponding author
- Wagner, Christian
- ORCID
- Wagner, Christian
- Venue
- Nature Photonics
- Published
- 2010-01
- Volume
- 4
- Issue
- 1
- Pages
- 24-26
- ISSN
- 1749-4885 (ISSN-L)
- 1749-4893
- OpenAlex
- W2975639389
- Cited by
- 650
- References
- 0
- Citations by year
- 2026: 46 · 2025: 48 · 2024: 52 · 2023: 52 · 2022: 52 · 2021: 40 · 2020: 59 · 2019: 44 · 2018: 42 · 2017: 44 · 2016: 37 · 2015: 40 · 2014: 35 · 2013: 25 · 2012: 16
- FWCI
- 8.99
- Type
- journal article
- Language
- en
- Open access
- closed
- Licence
- www.springer.com/tdm (tdm)
- Locations
- Nature Photonics (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
- Keywords
- EUV lithography, photolithography, integrated circuit fabrication, semiconductor manufacturing, high-volume manufacturing
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