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The DOI matches its Crossref record; 4 of the 4 references it cites were found in a registry or an index.

In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures

Chen, Wufeng, Yan, Lifeng·2011·Nanoscale

Abstract

Three-dimensional (3D) architectures of graphene are of interest in applications in electronics, catalysis devices, and sensors. However, it is still a challenge to fabricate macroscopic all-graphene 3D architectures under mild conditions. Here, a simple method for the preparation of 3D architectures of graphene is developed via the in situ self-assembly of graphene prepared by mild chemical reduction at 95 °C under atmospheric pressure without stirring. No chemical or physical cross-linkers or high pressures are required. The reducing agents include NaHSO(3), Na(2)S, Vitamin C, HI, and hydroquinone. Both graphene hydrogels and aerogels can be prepared by this method, and the shapes of the 3D architectures can be controlled by changing the type of reactor. The 3D architectures of graphene have low densities, high mechanical properties, thermal stability, high electrical conductivity, and high specific capacitance, which make them candidates for potential applications in supercapacitors, hydrogen storage and as supports for catalysts.

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Metadata

Authors
Chen, W., & Yan, L.
Venue
Nanoscale
Published
2011
Volume
3
Issue
8
Pages
3132
ISSN
  • 2040-3364 (ISSN-L)
  • 2040-3372
OpenAlex
W2065942418
Cited by
715
References
4
FWCI
21.07
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures. https://app.cochat.ai/papers/10.1039/c1nr10355e
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Chen, W., & Yan, L. (2011). In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures. Nanoscale. https://doi.org/10.1039/c1nr10355e

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