The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.
The use of atomic layer deposition in advanced nanopatterning
Abstract
This article reviews the patterning of films deposited by atomic layer deposition (ALD), as well as the use of ALD as an enabling technology in advanced nanopatterning schemes.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cites
Lu, J., Low, K.-B., Lei, Y., Libera, J. A., Nicholls, A., Stair, P. C., & Elam, J. W. (2014) · Nature Communications · doi:10.1038/ncomms4264 · Cited by 233
Bimetallic and Ternary Alloys for Improved Oxygen Reduction Catalysis
Nilekar, A. U., Xu, Y., Zhang, J., Vukmirovic, M. B., Sasaki, K., Adzic, R. R., & Mavrikakis, M. (2007) · Topics in Catalysis · doi:10.1007/s11244-007-9001-z · Cited by 216
Cited by
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Mackus, A. J. M., Merkx, M. J. M., & Kessels, W. M. M. (2019) · Chemistry of Materials · doi:10.1021/acs.chemmater.8b03454 · Cited by 426
Self-citationPost-Process Treatments for Additive-Manufactured Metallic Structures: A Comprehensive Review
Ge, J., Pillay, S., & Ning, H. (2023) · Journal of Materials Engineering and Performance · doi:10.1007/s11665-023-08051-9 · Cited by 157
Metadata
- Authors
- Mackus, A. J. M., Bol, A. A., & Kessels, W. M. M.
- Venue
- Nanoscale
- Publisher
- Royal Society of Chemistry (RSC)
- Published
- 2014
- Volume
- 6
- Issue
- 19
- Pages
- 10941-10960
- ISSN
- 2040-3364 (ISSN-L)
- 2040-3372
- OpenAlex
- W2137032131
- Cited by
- 380
- References
- 2
- FWCI
- 11.50
- Type
- journal article
- Language
- en
- Open access
- closed
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: The use of atomic layer deposition in advanced nanopatterning. https://app.cochat.ai/papers/10.1039/c4nr01954g
- The paper
- Mackus, A. J. M., Bol, A. A., & Kessels, W. M. M. (2014). The use of atomic layer deposition in advanced nanopatterning. Nanoscale. https://doi.org/10.1039/c4nr01954g
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
