The DOI matches its Crossref record; 36 of the 36 references it cites were found in a registry or an index.
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Open accessAbstract
Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently gaining momentum in semiconductor processing, because of the increasing need for eliminating the edge placement errors of top-down processing. Moreover, area-selective ALD offers new opportunities in many other areas such as the synthesis of catalysts with atomic-level control. This Perspective provides an overview of the current developments in the field of area-selective ALD, discusses the challenge of achieving a high selectivity, and provides a vision for how area-selective ALD processes can be improved. A general cause for the loss of selectivity during deposition is that the character of surfaces on which no deposition should take place changes when it is exposed to the ALD chemistry. A solution is to implement correction steps during ALD involving for example surface functionalization or selective etching. This leads to the development of advanced ALD cycles by combining conventional two-step ALD cycles with correction steps in multistep cycle and/or supercycle recipes.
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Citations
Cites
Atomic Layer Deposition: An Overview
George, S. M. (2010) · Chemical Reviews · doi:10.1021/cr900056b · Cited by 5,814
Engineering atomic and molecular nanostructures at surfaces
Barth, J. V., Costantini, G., & Kern, K. (2005) · Nature · doi:10.1038/nature04166 · Cited by 2,145
A brief review of atomic layer deposition: from fundamentals to applications
Johnson, R. W., Hultqvist, A., & Bent, S. F. (2014) · Materials Today · doi:10.1016/j.mattod.2014.04.026 · Cited by 1,996
Nanoelectronics from the bottom up
Lu, W., & Lieber, C. M. (2007) · Nature Materials · doi:10.1038/nmat2028 · Cited by 1,545
Catalyst Design with Atomic Layer Deposition
O’Neill, B. J., Jackson, D. H. K., Lee, J., Canlas, C., Stair, P. C., Marshall, C. L., Elam, J. W., Kuech, T. F., Dumesic, J. A., & Huber, G. W. (2015) · ACS Catalysis · doi:10.1021/cs501862h · Cited by 782
Bottom-up precise synthesis of stable platinum dimers on graphene
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The use of atomic layer deposition in advanced nanopatterning
Mackus, A. J. M., Bol, A. A., & Kessels, W. M. M. (2014) · Nanoscale · doi:10.1039/c4nr01954g · Cited by 380
Self-citationSynthesis and Stabilization of Supported Metal Catalysts by Atomic Layer Deposition
Lu, J., Elam, J. W., & Stair, P. C. (2013) · Accounts of Chemical Research · doi:10.1021/ar300229c · Cited by 329
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Cited by
Lodha, J. K., Pollentier, I., Conard, T., Vallat, R., De Gendt, S., & Armini, S. (2022) · Applied Surface Science · doi:10.1016/j.apsusc.2022.154657 · Cited by 16
Metadata
- Authors
- Mackus, A. J. M., Merkx, M. J. M., & Kessels, W. M. M.
- Venue
- Chemistry of Materials
- Publisher
- American Chemical Society (ACS)
- Published
- 2018-12-19
- Volume
- 31
- Issue
- 1
- Pages
- 2-12
- ISSN
- 0897-4756 (ISSN-L)
- 1520-5002
- OpenAlex
- W2904730684
- Cited by
- 426
- References
- 36
- FWCI
- 12.23
- Type
- journal article
- Language
- en
- Open access
- hybrid
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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
