The DOI matches its Crossref record; 4 of the 4 references it cites were found in a registry or an index.
Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
Abstract
Bringing an elastomeric phase mask into conformal contact with a layer of photoresist makes it possible to perform photolithography in the near field of the mask. This technique provides an especially simple method for forming features with sizes of 90–100 nm in photoresist: straight lines, curved lines, and posts, on both curved and planar surfaces. It combines experimental convenience, new optical characteristics, and applicability to nonplanar substrates into a new approach to fabrication. Nanowire polarizers for visible light illustrate one application for this technique.
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Cites
Kumar, A., & Whitesides, G. M. (1993) · Applied Physics Letters · doi:10.1063/1.110628 · Cited by 1,605
Self-citationPatterning Self-Assembled Monolayers: Applications in Materials Science
Kumar, A., Biebuyck, H. A., & Whitesides, G. M. (1994) · Langmuir · doi:10.1021/la00017a030 · Cited by 1,114
Self-citationHill, K. O., Malo, B., Bilodeau, F., Johnson, D. C., & Albert, J. (1993) · Applied Physics Letters · doi:10.1063/1.108786 · Cited by 1,104
Wavefront Engineering for Photolithography
Levenson, M. D. (1993) · Physics Today · doi:10.1063/1.881357 · Cited by 72
Cited by
One‐Dimensional Nanostructures: Synthesis, Characterization, and Applications
Xia, Y., Yang, P., Sun, Y., Wu, Y., Mayers, B., Gates, B., Yin, Y., Kim, F., & Yan, H. (2003) · Advanced Materials · doi:10.1002/adma.200390087 · Cited by 8,559
Xia, Y., & Whitesides, G. M. (1998) · Annual Review of Materials Science · doi:10.1146/annurev.matsci.28.1.153 · Cited by 4,611
Self-citationSoft Lithography in Biology and Biochemistry
Whitesides, G. M., Ostuni, E., Takayama, S., Jiang, X., & Ingber, D. E. (2001) · Annual Review of Biomedical Engineering · doi:10.1146/annurev.bioeng.3.1.335 · Cited by 2,607
Self-citationSoft lithography for micro- and nanoscale patterning
Qin, D., Xia, Y., & Whitesides, G. M. (2010) · Nature Protocols · doi:10.1038/nprot.2009.234 · Cited by 2,334
Self-citationNew Approaches to Nanofabrication: Molding, Printing, and Other Techniques
Gates, B. D., Xu, Q., Stewart, M., Ryan, D., Willson, C. G., & Whitesides, G. M. (2005) · Chemical Reviews · doi:10.1021/cr030076o · Cited by 2,020
Self-citation
Metadata
- Authors
- Rogers, J. A., Paul, K. E., Jackman, R. J., & Whitesides, G. M.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 1997-05-19
- Volume
- 70
- Issue
- 20
- Pages
- 2658-2660
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2020045825
- Cited by
- 297
- References
- 4
- FWCI
- 15.08
- Type
- journal article
- Language
- en
- Open access
- closed
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- Rogers, J. A., Paul, K. E., Jackman, R. J., & Whitesides, G. M. (1997). Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field. Applied Physics Letters. https://doi.org/10.1063/1.118988
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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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