The DOI matches its Crossref record.
Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
Abstract
We combine a self-organizing diblock copolymer system with semiconductor processing to produce silicon capacitors with increased charge storage capacity over planar structures. Our process uses a diblock copolymer thin film as a mask for dry etching to roughen a silicon surface on a 30 nm length scale, which is well below photolithographic resolution limits. Electron microscopy correlates measured capacitance values with silicon etch depth, and the data agree well with a geometric estimate. This block copolymer nanotemplating process is compatible with standard semiconductor processing techniques and is scalable to large wafer dimensions.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cited by
Directing the self-assembly of block copolymers
Darling, S. B. (2007) · Progress in Polymer Science · doi:10.1016/j.progpolymsci.2007.05.004 · Cited by 1,019
Block copolymer based nanostructures: Materials, processes, and applications to electronics
Kim, H.-C., Park, S.-M., & Hinsberg, W. D. (2010) · Chemical Reviews · doi:10.1021/cr900159v · Cited by 1,017
Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures
Stoykovich, M. P., Müller, M., Kim, S. O., Solak, H. H., Edwards, E. W., de Pablo, J. J., & Nealey, P. F. (2005) · Science · doi:10.1126/science.1111041 · Cited by 962
Nanostructure fabrication using block copolymers
Hamley, I. W. (2003) · Nanotechnology · doi:10.1088/0957-4484/14/10/201 · Cited by 773
Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays
Tang, C., Lennon, E. M., Fredrickson, G. H., Kramer, E. J., & Hawker, C. J. (2008) · Science · doi:10.1126/science.1162950 · Cited by 624
Metadata
- Authors
- Black, C. T., Guarini, K. W., Milkove, K. R., Baker, S. M., Russell, T. P., & Tuominen, M. T.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2001-07-16
- Volume
- 79
- Issue
- 3
- Pages
- 409-411
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W1998241405
- Cited by
- 351
- References
- 0
- FWCI
- 12.94
- Type
- journal article
- Language
- en
- Open access
- closed
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication. https://app.cochat.ai/papers/10.1063/1.1383805
- The paper
- Black, C. T., Guarini, K. W., Milkove, K. R., Baker, S. M., Russell, T. P., & Tuominen, M. T. (2001). Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication. Applied Physics Letters. https://doi.org/10.1063/1.1383805
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
