The DOI matches its Crossref record; 23 of the 23 references it cites were found in a registry or an index.
Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays
Abstract
The manufacture of smaller, faster, more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. Traditional self-assembling approaches based on block copolymer lithography spontaneously yield nanometer-sized hexagonal structures, but these features are not consistent with the industry-standard rectilinear coordinate system. We present a modular and hierarchical self-assembly strategy, combining supramolecular assembly of hydrogen-bonding units with controlled phase separation of diblock copolymers, for the generation of nanoscale square patterns. These square arrays will enable simplified addressability and circuit interconnection in integrated circuit manufacturing and nanotechnology.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cites
Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter
Park, M., Harrison, C., Chaikin, P. M., Register, R. A., & Adamson, D. H. (1997) · Science · doi:10.1126/science.276.5317.1401 · Cited by 1,866
Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
Ouk Kim, S., Solak, H. H., Stoykovich, M. P., Ferrier, N. J., de Pablo, J. J., & Nealey, P. F. (2003) · Nature · doi:10.1038/nature01775 · Cited by 1,660
Controlling polymer-surface interactions with random copolymer brushes
Mansky, P., Liu, Y., Huang, E., Russell, T. P., & Hawker, C. (1997) · Science · doi:10.1126/science.275.5305.1458 · Cited by 1,291
Self-citationPatterning with block copolymer thin films
Segalman, R. A. (2005) · Materials Science and Engineering: R: Reports · doi:10.1016/j.mser.2004.12.003 · Cited by 954
Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation
Kim, S. H., Misner, M. J., Xu, T., Kimura, M., & Russell, T. P. (2004) · Advanced Materials · doi:10.1002/adma.200304906 · Cited by 922
Graphoepitaxy of Spherical Domain Block Copolymer Films
Segalman, R. A., Yokoyama, H., & Kramer, E. J. (2001) · Advanced Materials · doi:10.1002/1521-4095(200108)13:15<1152::aid-adma1152>3.0.co;2-5 · Cited by 857
Self-citationTemplated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
Cheng, J. Y., Ross, C. A., Smith, H. I., & Thomas, E. L. (2006) · Advanced Materials · doi:10.1002/adma.200502651 · Cited by 695
A Generalized Approach to the Modification of Solid Surfaces
Ryu, D. Y., Shin, K., Drockenmuller, E., Hawker, C. J., & Russell, T. P. (2005) · Science · doi:10.1126/science.1106604 · Cited by 516
Self-citationSkotnicki, T., Hutchby, J. A., King, T., Wong, H.-S. P., & Boeuf, F. (2005) · IEEE Circuits and Devices Magazine · doi:10.1109/mcd.2005.1388765 · Cited by 453
Fabrication of nanostructures with long-range order using block copolymer lithography
Cheng, J. Y., Ross, C. A., Thomas, E. L., Smith, H. I., & Vancso, G. J. (2002) · Applied Physics Letters · doi:10.1063/1.1519356 · Cited by 415
Cited by
Block copolymer based nanostructures: Materials, processes, and applications to electronics
Kim, H.-C., Park, S.-M., & Hinsberg, W. D. (2010) · Chemical Reviews · doi:10.1021/cr900159v · Cited by 1,017
Macroscopic 10-terabit–per–square-inch arrays from block copolymers with lateral order
Park, S., Lee, D. H., Xu, J., Kim, B., Hong, S. W., Jeong, U., Xu, T., & Russell, T. P. (2009) · Science · doi:10.1126/science.1168108 · Cited by 740
Cyclic block copolymers for controlling feature sizes in block copolymer lithography
Poelma, J. E., Ono, K., Miyajima, D., Aida, T., Satoh, K., & Hawker, C. J. (2012) · ACS Nano · doi:10.1021/nn304217y · Cited by 189
Self-citationRodwogin, M. D., Spanjers, C. S., Leighton, C., & Hillmyer, M. A. (2010) · ACS Nano · doi:10.1021/nn901190a · Cited by 140
Handlin, D. L., Hansen, D. R., Wright, K. J., & Trenor, S. R. (2009) · Controlled and Living Polymerizations · doi:10.1002/9783527629091.ch10 · Cited by 9
Metadata
- Authors
- Tang, C., Lennon, E. M., Fredrickson, G. H., Kramer, E. J., & Hawker, C. J.
- Venue
- Science
- Published
- 2008-10-17
- Volume
- 322
- Issue
- 5900
- Pages
- 429-432
- ISSN
- 0036-8075 (ISSN-L)
- 1095-9203
- OpenAlex
- W2066350682
- Cited by
- 624
- References
- 23
- FWCI
- 28.29
- Type
- journal article
- Language
- en
- Open access
- closed
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays. https://app.cochat.ai/papers/10.1126/science.1162950
- The paper
- Tang, C., Lennon, E. M., Fredrickson, G. H., Kramer, E. J., & Hawker, C. J. (2008). Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays. Science. https://doi.org/10.1126/science.1162950
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
