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Cited by 591

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Field-effect transistors and intrinsic mobility in ultra-thin MoSe2 layers

Open access
Larentis, Stefano, Fallahazad, Babak, Tutuc, Emanuel·2012·Applied Physics Letters

Abstract

We report the fabrication of back-gated field-effect transistors (FETs) using ultra-thin, mechanically exfoliated MoSe2 flakes. The MoSe2 FETs are n-type and possess a high gate modulation, with On/Off ratios larger than 106. The devices show asymmetric characteristics upon swapping the source and drain, a finding explained by the presence of Schottky barriers at the metal contact/MoSe2 interface. Using four-point, back-gated devices, we measure the intrinsic conductivity and mobility of MoSe2 as a function of gate bias, and temperature. Samples with a room temperature mobility of ∼ 50 cm2/V·s show a strong temperature dependence, suggesting phonons are a dominant scattering mechanism.

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Metadata

Authors
Larentis, S., Fallahazad, B., & Tutuc, E.
Venue
Applied Physics Letters
Published
2012-11-26
Volume
101
Issue
22
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W2008155044
Cited by
591
References
1
FWCI
17.81
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Field-effect transistors and intrinsic mobility in ultra-thin MoSe2 layers. https://app.cochat.ai/papers/10.1063/1.4768218
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Larentis, S., Fallahazad, B., & Tutuc, E. (2012). Field-effect transistors and intrinsic mobility in ultra-thin MoSe2 layers. Applied Physics Letters. https://doi.org/10.1063/1.4768218

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