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High mobility ambipolar MoS2 field-effect transistors: Substrate and dielectric effects

Open access
Bao, Wenzhong, Cai, Xinghan, Kim, Dohun, Sridhara, Karthik, Fuhrer, Michael S.·2013·Applied Physics Letters

Abstract

We fabricate MoS2 field effect transistors on both SiO2 and polymethyl methacrylate (PMMA) dielectrics and measure charge carrier mobility in a four-probe configuration. For multilayer MoS2 on SiO2, the mobility is 30–60 cm2/Vs, relatively independent of thickness (15–90 nm), and most devices exhibit unipolar n-type behavior. In contrast, multilayer MoS2 on PMMA shows mobility increasing with thickness, up to 470 cm2/Vs (electrons) and 480 cm2/Vs (holes) at thickness ∼50 nm. The dependence of the mobility on thickness points to a long-range dielectric effect of the bulk MoS2 in increasing mobility.

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Metadata

Authors
Bao, W., Cai, X., Kim, D., Sridhara, K., & Fuhrer, M. S.
Venue
Applied Physics Letters
Published
2013-01-28
Volume
102
Issue
4
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W1963685984
Cited by
791
References
4
FWCI
37.74
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: High mobility ambipolar MoS2 field-effect transistors: Substrate and dielectric effects. https://app.cochat.ai/papers/10.1063/1.4789365
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Bao, W., Cai, X., Kim, D., Sridhara, K., & Fuhrer, M. S. (2013). High mobility ambipolar MoS2 field-effect transistors: Substrate and dielectric effects. Applied Physics Letters. https://doi.org/10.1063/1.4789365

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