The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.
Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens
Abstract
Poor aspect profiles of plasmonic lithography patterns are suffering from evanescent waves' scattering loss in metal films and decaying exposure in photoresist. To address this issue, we experimentally report plasmonic cavity lens to enhance aspect profile and resolution of plasmonic lithography. The profile depth of half-pitch (hp) 32 nm resist patterns is experimentally improved up to 23 nm, exceeding in the reported sub-10 nm photoresist depth. The resist patterns are then transferred to bottom resist patterns with 80 nm depth using hard-mask technology and etching steps. The resolution of plasmonic cavity lens up to hp 22 nm is experimentally demonstrated. The enhancement of the aspect profile and resolution is mainly attributed to evanescent waves amplifying from the bottom silver layer and scattering loss reduction with smooth silver films in plasmonic cavity lens. Further, theoretical near-field exposure model is utilized to evaluate aspect profile with plasmonic cavity lens and well illustrates the experimental results.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cites
Negative Refraction Makes a Perfect Lens
Pendry, J. B. (2000) · Physical Review Letters · doi:10.1103/physrevlett.85.3966 · Cited by 12,159
Wagner, C., & Harned, N. (2010) · Nature Photonics · doi:10.1038/nphoton.2009.251 · Cited by 650
Cited by
Principles of electromagnetic waves in metasurfaces
Luo, X. (2015) · Science China Physics, Mechanics & Astronomy · doi:10.1007/s11433-015-5688-1 · Cited by 580
Self-citationSwitchable Ultrathin Quarter-wave Plate in Terahertz Using Active Phase-change Metasurface
Wang, D., Zhang, L., Gu, Y., Mehmood, M. Q., Gong, Y., Srivastava, A., Jian, L., Venkatesan, T., Qiu, C.-W., & Hong, M. (2015) · Scientific Reports · doi:10.1038/srep15020 · Cited by 308
Metadata
- Authors
- Gao, P., Yao, N., Wang, C., Zhao, Z., Luo, Y., Wang, Y., Gao, G., Liu, K., Zhao, C., & Luo, X.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2015-03-02
- Volume
- 106
- Issue
- 9
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2015620100
- Cited by
- 166
- References
- 2
- FWCI
- 10.75
- Type
- journal article
- Language
- en
- Open access
- closed
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens. https://app.cochat.ai/papers/10.1063/1.4914000
- The paper
- Gao, P., Yao, N., Wang, C., Zhao, Z., Luo, Y., Wang, Y., Gao, G., Liu, K., Zhao, C., & Luo, X. (2015). Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens. Applied Physics Letters. https://doi.org/10.1063/1.4914000
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
