Student or educator? Sign up with your school email and get 6 months of Pro free.
Cited by 309

The DOI matches its Crossref record; 9 of the 9 references it cites were found in a registry or an index.

Fabrication of nanopillars by nanosphere lithography

Open access
Cheung, C L, Nikolić, R J, Reinhardt, C E, Wang, T F·2006·Nanotechnology

Abstract

A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere etch mask coated silicon substrates were etched using oxygen plasma and a time-multiplexed 'Bosch' process to produce nanopillars of different length, diameter and separation. Scanning electron microscopy data indicate that the silicon etch rates with the nanoscale etch masks decrease linearly with increasing aspect ratio of the resulting etch structures.

Overview

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Integrity signals

Registry

Crossref · 10.1088/0957-4484/17/5/028

Cites

9 of 9 references verified0 citation errors · 0 not checkable

Statistics

Verification

Claims the paper makes

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Self-check

Percentages, sums and reported differences re-computed from the paper’s own numbers.

The self-check needs the paper’s full text.

Citations

Cites

Show all 9 references

Cited by

See all 309

Metadata

Authors
Cheung, C. L., Nikolić, R. J., Reinhardt, C. E., & Wang, T. F.
Venue
Nanotechnology
Published
2006-02-10
Volume
17
Issue
5
Pages
1339-1343
ISSN
  • 0957-4484 (ISSN-L)
  • 1361-6528
OpenAlex
W2094409448
Cited by
309
References
9
FWCI
10.97
Type
journal article
Language
en
Open access
bronze

About these checks

Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.

Statistics and arithmetic are recomputed, not judged.

Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.

What counts as a claim ›How we measure confidence ›How we check this ›

Are you an author, or do you see a problem with this page? Request a review

How to cite

Cite CoChat for the checks on this page, and the paper for its own findings.

This page
CoChat. (2026). Citation check: Fabrication of nanopillars by nanosphere lithography. https://app.cochat.ai/papers/10.1088/0957-4484/17/5/028
The paper
Cheung, C. L., Nikolić, R. J., Reinhardt, C. E., & Wang, T. F. (2006). Fabrication of nanopillars by nanosphere lithography. Nanotechnology. https://doi.org/10.1088/0957-4484/17/5/028

Data sources

Bibliographic data: Semantic Scholar, OpenAlex, Crossref.

Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.