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Multiparametric scaling of diffraction intensities
Open accessAbstract
A novel and general approach to scaling diffraction intensities is presented. The method minimizes the disagreement among multiple measurements of symmetry-related reflections using a stable refinement procedure. The scale factors are described by a flexible exponential function that allows different scaling corrections to be chosen and combined according to the needs of the experiment. The scaling model presented here includes: scale and temperature factor per batch of data; temperature factor as a continuous function of the radiation dose; absorption in the crystal; uneven exposure within a single diffraction image; and corrections for phenomena that depend on the diffraction peak position on the detector. This scaling model can be extended to include additional corrections for various instrumental and data-collection problems.
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Metadata
- Authors
- Otwinowski, Z., Borek, D., Majewski, W., & Minor, W.
- Venue
- Acta Crystallographica Section A Foundations of Crystallography
- Published
- 2003-04-25
- Volume
- 59
- Issue
- 3
- Pages
- 228-234
- ISSN
- 0108-7673 (ISSN-L)
- OpenAlex
- W2161528588
- Cited by
- 656
- References
- 0
- FWCI
- 11.87
- Type
- journal article
- Language
- en
- Open access
- hybrid
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