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Cited by 443

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Silicon carbide high-power devices

Weitzel, C.E., Palmour, J.W., Carter, C.H., Moore, K., Nordquist, K.K., Allen, S., Thero, C., Bhatnagar, M.·1996·IEEE Transactions on Electron Devices

Abstract

In recent years, silicon carbide has received increased attention because of its potential for high-power devices. The unique material properties of SiC, high electric breakdown field, high saturated electron drift velocity, and high thermal conductivity are what give this material its tremendous potential in the power device arena. 4H-SiC Schottky barrier diodes (1400 V) with forward current densities over 700 A/cm/sup 2/ at 2 V have been demonstrated. Packaged SITs have produced 57 W of output power at 500 MHz, SiC UMOSFETs (1200 V) are projected to have 15 times the current density of Si IGBTs (1200 V). Submicron gate length 4H-SiC MESFETs have achieved f/sub max/=32 GHz, f/sub T/=14.0 GHz, and power density=2.8 W/mm @ 1.8 GHz. The performances of a wide variety of SiC devices are compared to that of similar Si and GaAs devices and to theoretically expected results.

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Metadata

Authors
Weitzel, C. E., Palmour, J. W., Carter, C. H., Moore, K., Nordquist, K. K., Allen, S., Thero, C., & Bhatnagar, M.
Venue
IEEE Transactions on Electron Devices
Published
1996
Volume
43
Issue
10
Pages
1732-1741
ISSN
0018-9383 (ISSN-L)
OpenAlex
W2145757162
Cited by
443
References
0
FWCI
18.45
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Silicon carbide high-power devices. https://app.cochat.ai/papers/10.1109/16.536819
The paper
Weitzel, C. E., Palmour, J. W., Carter, C. H., Moore, K., Nordquist, K. K., Allen, S., Thero, C., & Bhatnagar, M. (1996). Silicon carbide high-power devices. IEEE Transactions on Electron Devices. https://doi.org/10.1109/16.536819

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