Cited by 24Silicon Carbide Semiconductor TechnologiesIntegrated Circuits and Semiconductor Failure AnalysisSemiconductor materials and devices

The DOI matches its Crossref record; 30 of the 30 references it cites were found in a registry or an index.

Brief history of JEDEC qualification standards for silicon technology and their applicability(?) to WBG semiconductors

McPherson, J. W.·2018·2018 IEEE International Reliability Physics Symposium (IRPS)

Abstract

A brief history of JEDEC qualification standards for Si-based technology is presented. JEDEC qualification standards have evolved over the years due to Si-technology process changes, better understanding of chip operating conditions, and improvements in our understanding of the reliability physics. One of the more significant evolutionary developments is how high temperature operation life (HTOL) testing is now viewed. HTOL testing, while it is necessary for device qualification, it is far from being sufficient. HTOL testing does not adequately address many of the important failure mechanisms for Si-ICs (EM, SM, TDDB, HCI, and BTI). For this reason, JEDEC standards in recent years have tended to focus more on reaching industry consensus on required reliability stress-structures, reliability stress-conditions, and reliability models. As for wide band gap (WBG) semiconductors, and the expectation of very high operating temperatures for power devices, reliability assurance for WBG devices is critically important. Reliability assurance for WBG devices will undoubtedly depend strongly on developing appropriate: reliability test structures, test conditions, and failure models.

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Crossref · 10.1109/irps.2018.8353556

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Citations

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Research works printed but not linked: 24

  1. coffin, 1963, Met Eng Q, 3
  2. mcpherson, 1987, A Model for Stress-Induced Metal Notching and Voiding in VLSI Al-Si Metallization, J Vac Sci Technology B, 1321
  3. klema, 1984, Reliability Implications of Nitrogen Contaminated during Deposition of Sputtered Aluminum/Silicon Metal Films, IEEE International Reliability Physics Symposium Proceedings, 1
  4. 0, JEDEC Standards Documents
  5. 0, JEDEC Standards Committee
  6. kikkawa, 2015, Commercialization and Reliability of 600V GaN Power Switches, IEEE-IRPS, 6c 1 1
  7. 0, AEC-Q100 Failure Mechanisms Based Stress Test Qualification for ICs
  8. 0, JEDEC Standards Documents
  9. dunn, 1990, Temperature Cycling Acceleration Factors in VLSI Applications, IEEE International Reliability Physics Symposium Proceedings, 252
  10. 0, JEDEC Standards Documents
  11. 0, JEDEC Standards Documents
  12. 0, JEDEC Standards Documents
  13. 0, JEDEC Standards Documents
  14. 0, JEDEC Standards Documents
  15. 0, JEDEC Standards Documents
  16. 0, JEDEC Standards Publications
  17. 0, JEDEC Standards Documents
  18. 0, JEDEC Standards Documents
  19. 0, JEDEC Standards Documents
  20. 0, JEDEC Standards Documents
  21. 0, JEDEC Standards Documents
  22. 0, JEDEC Standards Committee
  23. meneghesso, 2012, Reliability of GaN HEMTs, IRPS Tutorial
  24. lenci, 2012, Au-free, High Breakdown AlGaN/GaN MISHEMTs with Low Leakage, High Yield and Robust TDDB Characteristics, CS MANTECH Conference

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Metadata

Authors
McPherson, J. W.
Corresponding author
McPherson, J. W.
Venue
2018 IEEE International Reliability Physics Symposium (IRPS)
Publisher
IEEE
Published
2018-03
Pages
3B.1-1-3B.1-8
ISSN
0735-0791 (ISSN-L)
OpenAlex
W2799476140
Cited by
24
References
30
Citations by year
2026: 1 · 2025: 2 · 2024: 1 · 2023: 5 · 2022: 3 · 2020: 8 · 2019: 2 · 2018: 2
FWCI
4.79
Type
conference paper
Language
en
Open access
closed
Locations
IEEE International Reliability Physics Symposium proceedings (publishedVersion)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Integrated Circuits and Semiconductor Failure Analysis
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
Keywords
silicon technology, wide bandgap semiconductors, reliability physics, device reliability, failure models, power devices, high-temperature operation, electromigration, hot carrier injection, time-dependent dielectric breakdown, bias temperature instability

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